在積體電路與微機電元件中，薄膜的機械性質佔著舉足輕重的重要性，近年來人們利用一些方法量測薄膜的機械性質。吹氣試驗是其中一種方式，它所使用的設備簡易，而且實驗所得到的資訊也相當豐富。利用Vlassak等人推導的吹氣試驗公式，經由曲線擬合得到一組殘餘應力、起始高度與雙軸模數的解。利用微機械製作的方式在矽晶片上製備懸浮薄膜試片，再以麥克森干涉儀量測薄膜受吹氣鼓起的高度，再將高度對應壓力的曲線經由曲線擬合的方式可知薄膜機械性質，其中試片尺寸量測對實驗解的精確度影響很大。在本論文中，我們利用吹氣試驗量測SiNx, Pt/Ti/SiNx 和 Pd/Ti/SiNx薄膜受氫氣影響所導致的機械性質改變。
在實驗中所用的環境氣氛包含純氬氣、5%、10%和20%氫氣。改變氫氣濃度，對Pt/Ti/SiNx的殘餘應力與彈性係數並沒有明顯的影響。但增加氫氣濃度，使Pd/Ti/SiNx薄膜的彈性係數降低。而氫原子進入Pd/Ti，使金屬膜體積膨脹而SiNx卻限制住薄膜，因此Pd/Ti/SiNx薄膜在未施壓時即有一個明顯的起始高度，並使其殘餘應力變為負值。若除去SiNx的效應，在10%和20%氫氣中Pd/Ti薄膜的彈性係數為負值。如何解釋彈性係數出現負值，SiNx是否與氫氣反應需要再探討，而在本實驗中，氫氣對金屬反應的系統，無論在實驗上與理論上的實驗分析方法的精確性，需要再檢驗與探討。

In ULSI technology, MEMS devices, and wear-resisting coating, the films created a strong interest in mechanical properties. Several methods are used to measure the mechanical properties of thin films. Bulge test has a great virtue is that the relatively simplicity of the apparatus. Thus, we use bulge test to measure the mechanical property changes of Pt/Ti/SiNx and Pd/Ti/SiNx membranes induced by hydrogen.
Based on exact solution described by Vlassak, the curve fitting method is used in the work to obtain a set of residual stress, initial height, and biaxial modulus. The specimen geometry has a tremendous influence on accuracy. Micromachining techniques using Si substrate apply to fabricate the bulge samples of free-standing substrate. The Michelson interferometry is used to measure the deflection of the membrane as pressure loading. In our works, bulge test experiment is preformed on SiNx, Pt/Ti/SiNx and Pd/Ti/SiNx films to obtain the curve of pressure versus deflection of center of the membrane. By curve fitting method, residual stress, biaxial modulus and initial height are acquired.

The ambient gas are Ar, 5 % H2, 10 % H2, and 20 % H2. Varying H2 concentration, the residual stress and modulus of Pt/Ti/SiNx does not alter apparently. As H2 concentration increases, the residual stress of Pd/Ti/SiNx membrane abruptly decreases to minus values. Hydrogen adsorption in metals causes the volume expansion, and the SiNx restricts the metals. Thus, a significant initial height exists and residual stress has minus values. The elastic constant of Pd/Ti/SiNx membrane decreases as H2 concentration increases. While the elastic constant subtract effect of SiNx, minus values appear in 10 % H2, and 20 % H2. Whether the SiNx film interacts with hydrogen need to be concerned. The accuracy of the results from the data analysis needs further examination experimentally and theoretically.

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