以脈衝電鍍法成長銅鈷多層膜及其磁性性質之研究

簡易檢索 / 詳目顯示

回結果列表

研究生：	呂理誠 Lii-Cherng Leu
論文名稱：	以脈衝電鍍法成長銅鈷多層膜及其磁性性質之研究 Growth and Magnetic Properity of Co-Cu/Cu Multilayers by Pulsed electrodeposition
指導教授：	施漢章 H.C. Shih
口試委員:
學位類別：	碩士 Master
系所名稱：	工學院 - 材料科學工程學系 Materials Science and Engineering
論文出版年：	2000
畢業學年度：	88
語文別：	中文
論文頁數：	75
中文關鍵詞：	脈衝電鍍法、多層膜、巨磁阻、磁性
外文關鍵詞：	Pulsed electrodepodition, multilayers, giant magnetoresistance, magnetic
相關次數：	點閱：123 下載：0
分享至:	分享至facebook 分享至twitter

查詢本校圖書館目錄查詢臺灣博碩士論文知識加值系統勘誤回報

隨著網際網路的發達，對於高容量硬碟機的需求也日趨殷切。1988年由IBM的研究發現由Fe和Cr交替成長的多層膜具有巨磁阻效應，後來發現此現象普遍存在於鐵磁性與非鐵磁性的多層膜系統中，其中又以鈷銅系統的巨磁阻現象為最大，因此被視為磁紀錄的下一代新星。一般而言，巨磁阻多層膜的備製皆以高真空系統為主。然而，另一項以電化學為主的製程技術－脈衝電鍍法也慢慢受到重視，特別是其具備了設備便宜、製程簡單的優勢利於工業量產。此篇論文即探討以脈衝電鍍法成長具巨磁阻之銅鈷多層膜。實驗乃於瓦特浴中進行，調配工作電壓以成長具超晶格之多層膜結構並以X光繞射儀鑑定之。探討此結構下，不同優選方向之矽晶基材上及導電層上沉積之薄膜的磁滯曲線與磁阻變化。磁性的量測係由磁光科爾效應儀及四點量測裝置完成。實驗結果顯示以脈衝電鍍法的確能成功地成長出銅鈷多層膜，然而由於薄膜的表面粗糙度引響，明顯的反鐵磁偶合交互作用並未被發現。磁阻變化則以Si/Cu50A/Pt100A/[(Co85Cu15)20A /Cu20A]20 所量測出的6.8%為最高。

In the past few years magnetic multilayers have been the subject of tremendous effect. This effort is mainly based on the very interesting magnetic and electrical phenomena that can be observed in these artificially layered structures exhibiting giant magnetoresistance. Among the methods preparing samples of this effect are mainly based on high vacuum deposition equipment. However, the capability to produce such extremely finely layered materials includes electrodeposition that has the advantages of low cost and high throughput. The purpose of this thesis is to electrodeposit magnetic multilayers exhibiting GMR effect. It is successful to grow magnetic Co-Cu/Cu multilayer exhibiting nano-scale superlattice by pulsed electrodeposition. The magnetization loop doesn't show large antiferromagnetic exchange coupling measured by Magneto-Optic Kerr Effect Technique (MOKE). The maximum measured MR ratio of the electrodeposited magnetic multilayer Si/Cu50A/Pt100A/[(Co85Cu15)20A /Cu20A]20 is 6.8%.

CONTENT
摘要…………………………………………………………...Ⅰ

Abstract……………………………………………………….  Ⅱ

誌謝…………………………………………………………..   Ⅲ

1.   Introduction………………………………………………        1

1-1  Magnetic storage………………………………………  1

1-2  The Magic of Magnetic Multilayers……………………...    4

1-3  Magnetic Recording Sensors……………………………        9

2.   Paper Review……………………………………………...       12

2-1  Giant Magnetoresistance………………………………..       12

2-2  Electrodeposition of Multilayer Superlattice……………...       17

2-3  Growth of Multilayer Nanowires………………………...     20

3.   Experiment and Characterization………………………….    25

3-1  Sample Preparation……………………………………. 25

3-2  Electrodeposition of Co-Cu/Cu Multilayers………………   26

     3-2.1  Plating Electrolyte………………………………      26

     3-2.2  Experiment Apparatus…………………………..       27

     3-2.3  Pulsed Electrodeposition of Co-Cu/Cu Multilayers...      30

3-3  Characterization of Electrodeposited Co-Cu/Cu Multilayer Superlattice…………………………………………… 36

        3-3.1  Electron Probe X-ray Microanalyzer (EPMA)…….        36

        3-3.2  X-ray Diffraction (XRD)………………………..   36

        3-3.3  Field Emission Scanning Electron Microscopy

(FESEM)……………………………………………... 36

3-3.4  Atomic Force Microscopy (AFM)………………..37

3-3.5  M-H Curve Measurement (MOKE)………………      37

3-3.6  MR Measurement ( I-V 4 Point Method)…………. 38

4. Result and Discussion……………………………………...      40

   4-1               Characterization of Electrodeposited Co-Cu/Cu

        Multilayer on (100) Oriented Substrate…………………..       40

4-1.1        X-ray Diffraction Pattern………………………...40

4-1.2        MR Measurement of Electrodeposited Magnetic     Multilayers……………………………………..       44

4-1.3        Characterization of Antiferromagnetic Exchange Coupling by MOKE Measurement………………..       48

4-1.4        Surface Roughness Analysis by Atomic Force Microscopy……………………………………..     50

4-2  Magnetoresistance Oscillation Dependence on Copper Spacer Layer Thickness………………………………………..       52

4-3  Characterization of Electrodeposited Co-Cu/Cu Multilayer on (111) Oriented Substrate………………………………... 62

4-4  Characterization of Electrodeposited Co-Cu/Cu Multilayer on (100) Oriented Si/Cu 50A/Pt 100A Substrate……………..      65

5. Conclusion…………………………………………………  69

Future work…………………………………………………..  71

Reference……………………………………………………..  72

1. M. Williams, IBM Almaden Research Center, unpublished calculations.
2. G. Binasch, P. Grunberg, F. Saurenbach, and W. Zinn, "Enhanced Magnetoresistance in Layered Magnetic Structures with Antiferromagnetic Interlayer Exchange," Phys. Rev. B 39, No. 7, 4828 (1989).
3. M. N. Baibich, J. M. Broto, A. Fert, F. Nguyen van Dau, F. Petroff, P. Etienne, G. Creuzet, A. Friederich, and J. Chazelas, "Giant Magnetoresistance of (001)Fe/(001)Cr Magnetic Superlattices," Phys. Rev. Lett. 61, 2472 (1988).
4. S. S. P. Parkin, N. More, and K. P. Roche, "Oscillations in Exchange Coupling and Magnetoresistance in Metallic Superlattice Structures: Co/Ru, Co/Cr, and Fe/Cr," Phys. Rev. Lett. 64, 2304 (1990).
5. P. Grunberg, R. Schreiber, Y. Pang, M. B. Brodsky, and H. Sowers, "Layered Magnetic Structures: Evidence for Antiferromagnetic Coupling of Fe Layers Across Cr Interlayers," Phys. Rev. Lett. 57, No. 19, 2442 (1986).
6. S. S. P. Parkin, "Systematic Variation of Strength and Oscillation Period of Indirect Magnetic Exchange Coupling Through the 3d, 4d and 5d Transition Metals," Phys. Rev. Lett. 67, 3598 (1991).
7. T. R. McGuire and R. I. Potter, IEEE Trans. Magn., vol. MAG-11, p. 1018, 1975.
8. T.Shinjo and H. Yamamoto, J. Phys. Soc. Jpn., vol. 59, p. 3061, 1990.
9. B. Dieny, V. S. Speriosu, S. S. P. Parkin, B. A. Gurney, D. R. Wilhoit, and D. Mauri, "Giant Magnetoresistance in Soft Ferromagnetic Multilayers," Phys. Rev. B 43, 1297 (1991).
10. L.T. Romankiw, Proc. of 2nd Int. Symp. on Magn. Mat., Processes and Devices, Electrochem. Soc. Proc., vol. 92-10, p. 367, 1992.
11. M Alper, K. Attenborough, R. Hart, S. J. Lane, D. S. Lashmore, C. Younes and W. Schwarzacher, Appl. Phys. Lett., vol. 63, p.2144, 1993.
12. M. Alper, K. Attenborough, V. Baryshen, R. Hart, D. S. Lashmore and W. Schwarzacher, J. Appl, Phys., vol. 75, p.6543, 1994.
13. S. K. Lenczowski, C. Schonenberger, M. A. M. Gijis, W. J. M. de Jonge, J. Magn. Magn. Mat., vol 148, p. 455, 1995.
14. K. D. Bird and M. Schlesinger, J. Electrochem. Soc., vol. 142, p. L65, 1995.
15. Y. Ueda, N. Hataya and H. Zaman, J. Magn. Magn. Mat., vol. 156, p350, 1996.
16. W. Schwarzacher and D. S. Lashmore, IEEE Trans. Magn., vol. 32, p. 3133, 1996.
17. S. Kashiwabara, Y Jyoko and Y. Hayashi, Physica B., vol.239, p. 47, 1997.
18. W. Schwarzacher, K. Attenborough, A. Michel, G. Nabiyouni and J. P. Meier, J. Magn. Magn. Mat., vo1. 165, p. 23, 1997.
19. H. Zaman, S. Ikeda and Y. Ueda, IEEE Trans. Magn., vol. 33, p. 3517, 1997.
20. M. Alper, and W. Schwarzacher, J. Electrochem. Soc., vol. 144, p. 2346, 1997.
21. Y. Joyko, S. Kashiwabara and Y. Hayashi, J. Electrochem. Soc., vol. 144, p. L5, 1997.
22. A. P. O'Keeffe, O. I. Kasyutich and W. Schwarzacher, Appl. Phys. Lett., vol. 73, p.1002, 1998.
23. Y. Jyoko, S. Kashiwabara, Y. Hayashi and W. Schwarzacher, IEEE Trans. Magn., vol. 34, p. 3910, 1998.
24. M. Shima, L. Salamanca -Riba, T. R. Moffat and R. D. mcMichael, J. Magn. Magn. Mat., vo1. 198-199, p. 52, 1999.
25. Y. Ueda, N. Kikuchi, S. Ikeda and T. Houga, J. Magn. Magn. Mat., vo1. 198-199, p. 740, 1999.
26. D. S. Lashmore and M. P. Dariel, J. Electrochem. Soc., vol. 135, p. 1218, 1988.
27. J. Inoue, H. Itoh and S. Maekawa, J. Phys. Soc. Jpn., vol. 61, p.1149, 1992；H. Itoh, J. Inoue and S. Maekawa, J. Magn. Magn. Mat., vol. 126, p.479,1993.
28. S. S. P. Parkin, R. Bhadra, and K. P. Roche, Phys. Rev. Lett., 66, 2152 (1991).
29. S. S. P. Parkin, Z. G. Li, and D. J. Smith, Appl. Phys. Lett,,. 58, 2710 (1991).
30. G. E. Possin, Rev. Sci. Inst., vol. 41, p. 772, 1970.
31. P. B.Price and R. M. Walker, J. Appl, Phys., vol. 33, p.3407, 1962.
32. S. Kawai and R. Ueda, J. Electrochem. Soc., vol. 122. p. 32, 1975.
33. R. M. Penner and C. R. Martin, Anal. Chem., vol. 59, p. 2625, 1987；C. R. Martin, Science, vol. 266, p. 1961, 1994.
34. R. M. Penner and C. R. Martin, J. Electrochem. Soc., vol. 133, p. 2206, 1986.
35. J. D. Klein, R. D. HerrickⅡ, D. Palmer, M. J. Sailor, C. J. Brumlik, and C. R. Martin, Chem. Mater., vol. 5, p.902, 1993.
36. D. AlMawlawi, N. Coombs and M. Moskovits, J. Appl. Phys., vol. 70, p.4421, 1991.
37. L. Piraux, J. M. George, J. F. Despres, C. Leroy, E. Ferain, R. Legras, K. Ounadjela and A. Fert, Appl. Phys. Lett., vol. 65, p. 2484, 1994.
38. A. Blondel, J. P. Meier, B. Doudin and J. -Ph. Ansermet, Appl. Phys. Lett., vol. 65, p. 3019, 1994.
39. K. Liu, K. Nagodawithana, P. C. Searson and C. L. Chien, Phy Rev B., vol. 51. p. 7381. 1995.
40. S. Dubois, C. Marchal, J. M. Bruken and L. Piraux, Appl. Phys. Lett., vol. 70, p. 396, 1997.
41. W. Schwarzacher, O. I. Kasyutich, P. R. Evans, M. G. Darbyshire, Ge Yi, V. M. Fedosyuk, F. Roussraux, E. Cambril, D. Decanini, J. Magn. Magn. Mat., vol. 198-199, p.185, 1999.
42. S. Z. Hua, D. S. Lashmore, L. Salamanca-Riba, W. Schwarazacher, L. J. Swartzendruber, R. D. McMichael, L. H. Bennett and R. Hart, J Appl. Phys., vol. 76, p. 6519, 1994.

全文公開日期本全文未授權公開 (校內網路)

全文公開日期本全文未授權公開 (國家圖書館：臺灣博碩士論文系統)

簡易檢索 / 詳目顯示

相關論文