本研究目的為建立變壓器耦合式電漿源系統，使用實驗室自行研發的低頻功率源，頻率操作範圍為15-250 kHz，目前已經成功設計出最大功率可達1-2 kW，電漿密度在1012-1013 cm-3的高密度電漿源。使用電路量測方法，量測電漿的電壓電流訊號，使用Pspice軟體來進行電漿的電路模擬分析，成功建立電漿等效電路模型。針對氬氣與氮氣兩種不同氣體，由Langmuir probe量測結果與Pspice模擬比較來討論各自的電漿特性。

參考文獻
[1] L. Xiao-jing, Q. G.-j. a, and C. Jie-rong, "The effect of surface modification by nitrogen plasma on photocatalytic degradation of polyvinyl chloride films," Applied Surface Science, vol. 254, pp. 6568-6574, 2008.
[2] M. Laroussi, "Sterilization of contaminated matter with an atmospheric pressure plasma," Plasma Science, IEEE Transactions on, vol. 24, pp. 1188-1191 1996.
[3] J. Hopwood, "Review of inductively coupled plasmas for plasma processing," Plasma Sources Sci. Technol., vol. 1, pp. 109-116, 1992.
[4] C. G. Smith, "Studies of a Ring Discharge," Physical Review, vol. 59, pp. 997-1004, 1941.
[5] H. U. Eckert, "Induction Plasmas at Low Frequencies," AIAA Journal, vol. 9, pp. 1452-1456, 1971.
[6] H. U. Eckert, "An Electrodeless Discharge at 60 Hz," Plasma Science, IEEE Transactions on, vol. 2, pp. 308-309, 1974.
[7] I. M. Ulanov, M. V. Isupov, and A. Y. Litvintsev, "Experimental study of transformer-coupled toroidal discharge in mercury vapour," Journal of physics. D, Applied physics, vol. 40, pp. 4561-4567, 2007.
[8] "BiCMOS Phase Modulation/Soft Switching Controller," ed. Micro Linear, 1997.
[9] "3C94 Material Specification," ed. Ferroxcube, 2008.
[10] F. F. Chen, Plasma Diagnostic Techniques, 1965.
[11] A. Shabalin, "High-pressure operation of a toroidal, inductively coupled discharge," Plasma Sources Sci. Technol., vol. 13, pp. 588-593, 2004.
[12] M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing. Wiley, 1994.
[13] R. L. Boylestad, Introductory circuit analysis, 1987.