本實驗藉由電子束微影技術，電子束蒸鍍系統以及濕式蝕刻的方式，利用材料熱膨脹係數的不同造成應力釋放使結構捲曲，製作出立體的磁性環形結構，透過本實驗室自行架設的磁阻量測系統，來量測此立體環形結構的磁阻性質。理論上，平面磁性環形結構在外加磁場下，其兩端的渦旋磁壁旋性是隨機產生，可能產生相同旋性渦旋磁壁的封閉磁化態，形成兩階段的翻轉；或是產生相反旋性的渦旋磁壁，此種結構不會產生封閉磁化態，因而形成ㄧ階段翻轉。由磁阻量測結果可知此長條狀磁膜平面時的磁阻性質和捲曲成立體環狀後的磁阻性質明顯有很大的差異。
此外，我們改變實驗條件如基板二氧化矽的厚度、所鍍的金屬材料，對環形結構之捲曲程度與所成環形大小之影響加以研究探討，並改變環形結構的長度、線寬和釘扎缺口來探討內部磁化態的轉變。

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