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研究生: 陳信宏
Shin-Hung Chen
論文名稱: 脊狀矽線波導製程及分析損耗和耦合效率
Fabrication of nano-fin silicon wire waveguide and analysis of loss and coupling
指導教授: 李明昌
Ming-Chang Lee
口試委員:
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 光電工程研究所
Institute of Photonics Technologies
論文出版年: 2007
畢業學年度: 95
語文別: 中文
論文頁數: 73
中文關鍵詞: 波導純氫煅燒超高真空煅燒
相關次數: 點閱:3下載:0
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  • 在本論文中我們介紹三維錐形光耦合器與脊狀矽線波導在經純氫煅燒跟熱氧化過程中會自動整合在一起。我們使用BPM來模擬我們設計的元件結構,包含脊狀矽線波導的單模截止狀態的計算和三維錐形光耦合器的耦合效率。製程部分使用超高真空(~10-7torr)煅燒技術來製作一脊狀矽線波導波導,並觀察到有跟純氫煅燒製程出現相同的底切(under cut)的狀態。量測部分使用直接對準光纖跟耦合器來量測所製程之波導結構的傳播損耗為1.26dB/cm跟耦合器的損耗2.5dB/taper
    length。


    Demonstrated a novel silicon wire as well as a 3-D tapered coupler can be formed simultaneously through hydrogen annealing process. We use BPM to simulate our device structure, including the mode profile and coupling efficiency of the 3-D tapered coupler. We demonstrated ultra-high vacuum annealing can be used for fabricating the silicon wire waveguide, and observed the under-cut between the Si/SiO2 interface which is also shown in hydrogen annealing. We used cut-back method to measure the propagation loss and the coupler loss in our silicon wire waveguide, and found the propagation loss and coupler loss are 1.26(dB/cm) and 2.5(dB/taper length), respectively.

    摘要......................................................I Abstract................. ..............................II 致謝.....................................................III 目錄......................................................IV 第一章 緒論..... ....................................1 1-1 前言........ ......................................1 1-1.1表面粗糙對光波導傳播損耗的影響.......................1 1-1.2 次微米光波導與光纖耦合的問題與解決方法..............4 1-2 矽光波導元件種類......................................7 1-3 光耦合元件............................................9 1-4 研究動機與目的....................................... 12 1-5論文架構...............................................14 第二章 理論背景..........................................15 2-1 光波導原理和光耦合原理................................15 2-1.1光波導原理...........................................15 2-1.2光波導與外界元件耦合原理.............................23 2-2 脊狀矽線波導結構外型介紹..............................26 2-3 計算單模跟截止狀態....................................28 2-3.1 Beam propagation method ............................28 2-3.2 元件單模和截止狀態的計算............................29 2-4 三維錐形光耦合器與脊狀矽線波導之整合..................31 2-5 計算coupling efficiency ..............................33 第三章 元件製程流程......................................36 3-1 元件製作流程之介紹....................................36 3-2 純氫煅燒和超高真空煅燒製程探討........................45 3-2.1純氫煅燒.............................................45 3-3.2超高真空煅燒.........................................50 3-3超高真空製程參數分析...................................57 第四章 元件量測..........................................60 4-1實驗量測架設...........................................60 4-2傳播損耗之量測.........................................63 4-3耦合器損耗之量測.......................................65 第五章 結論..............................................67 參考文獻..................................................69

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