目前市面上半導體產業採用的主流自動光學檢測（Automatic Optical Inspection）法，是為X-射線斷層影像合成法（X-ray computed Tomosynthesis）。比較起其它的影像重建法，X-射線斷層影像合成法有相對簡單、計算量小的優點。但X-射線斷層影像合成法在本質上存在一些缺點，如常見的：採用「位移疊加」（shift & add）而產生的殘影效應（Shadow effect）。而在此研究中將殘影效應分為兩類：1. 「連續體殘影效應」、2. 「遮蔽物殘影效應」。
本研究針對殘影效應使用三種改善的方法。
第一：使用醫學影像處理領域中改善殘影效應的技術：「斷層影像濾波合成法（Ectomography）」。
第二：兼具「位移疊加法（shift-and-add）」及「位移取最大值法（shift-and-maximum）」特性的「整合型斷層影像合成術（Hybrid-tomosynthesis）」。
第三：針對投影取像架構的轉換函數（Transfer function），推導出濾波方程式進行濾波去殘影效應的「逆反濾波法（Inverse filtering）」。
本論文從理論出發，介紹上述三種方法，並電腦模擬實際工業光學檢測環境下的三種去殘影技術的結果，並分析給出使用建議。

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