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研究生: 吳承平
Wu, Chen-Ping
論文名稱: 新穎矽/石墨烯/單層氧化鋅異質接面電晶體之製作與特性研究
The Fabrication and Characterization of A New Silicon/Graphene/Monolayer Zinc-Oxide Heterojunction Transistor
指導教授: 徐永珍
Hsu, Klaus Yung-Jane
口試委員: 賴宇紳
Lai, Yu-Sheng
江雨龍
Jiang, Yeu-Long
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 電子工程研究所
Institute of Electronics Engineering
論文出版年: 2019
畢業學年度: 108
語文別: 中文
論文頁數: 100
中文關鍵詞: 石墨烯氧化鋅
外文關鍵詞: Graphene, Zinc-Oxide
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  • 由於積體電路的尺寸逐漸微縮,所以二維材料近年來受到許多研究團隊的關注。因為石墨烯具有可大面積成長、高載子遷移率以及高透光率等特色,使得他成為高速元件和光感測器中熱門的研究材料。而鋅在自然環境中的含量相當豐沛價格也較為便宜,因此氧化鋅透明導電薄膜也逐漸成為研究的目標。本論文將石墨烯與氧化鋅分別作為電晶體的基極端和射極端,並以矽基板作為集極端。由於單層的石墨烯與氧化鋅都很薄,因此可減少載子在基極中的複合機率以便提高電流增益,且可降低入射光被反射的機會。而石墨烯的特性與金屬相似,即便作為基極時使得基極很薄,也不必擔心電晶體會發生擊穿(punch through)現象,綜合以上概念本論文製作出一個在低偏壓的操作時具有高共射極電流增益(common-emitter current gain)的異質接面電晶體,並且具有不錯的電流與電壓響應度。


    Because of the trend of size scaling in intergrated circuit, 2D material has received the attention of many research teams in recent years. Due to the edges on large-area production, high mobility and high optical transmittance, graphene has become a hit in the research field of the high-speed device and photodetector. On the other hand, transparent conducting thin film composed of Zinc oxide has gained lots of research momentum as well for its natural abundance in environment and low cost.
    In this study, graphene and ZnO are served as Base and Emitter in the transistor, respectively, while the Si is served as Collector. For the extremely thin thickness in mono-layered graphene and ZnO, not only the probability of carrier recombination in Base can be decreased, which facilitates current gain, but also the reflection of the incident beam can be decreased. Regardless of the ultra thin Base, the metal-like characteristic of the graphene makes punch through effect barely happen. To sum up, we demonstrated a heterojunction transitor exhibiting high common-emitter current gain under the working condition of low bias voltage and remarkable current and voltage responsivity.

    摘要 I Abstract II 致謝 III 目錄 V 圖目錄 VIII 表目錄 XIII 第一章 前言 1 1.1 石墨烯二維材料的發現 1 1.2石墨烯材料的特性及應用 2 1.3透明導電薄膜的特性及應用 3 1.4研究動機 4 1.5論文章節架構 7 第二章 石墨烯的基礎特性 8 2.1石墨烯的晶格結構與特性 8 2.2石墨烯的導電性 11 2.3 石墨烯的拉曼光譜分析 12 2.3.1拉曼光譜簡介 12 2.3.2拉曼散射的基本原理 12 2.3.3石墨烯的拉曼光譜 13 2.3.4石墨烯的拉曼光譜的判讀 14 第三章 氧化鋅的基礎特性 15 3.1氧化鋅的基本性質與應用 15 3.2常見的氧化鋅檢測分析 17 3.2.1 X光繞射儀(X-ray Diffraction, XRD)的基本原理 17 3.2.2 X光反射儀(X-ray Reflectivity, XRR)的基本原理 18 第四章 光感測器原理介紹 19 4.1光二極體原理 19 4.2光電晶體原理 20 4.3光感測器的特性簡介 23 4.3.1量子效率(Quantum efficiency) 23 4.3.2響應度(Responsivity) 24 4.3.3響應速度(Response time) 25 4.3.4暗電流與雜訊 (Dark current & Noise) 26 4.4蕭特基(Schottky)與歐姆(Ohmic)接觸 27 4.5石墨烯/n型矽蕭特基接面光感測元件 32 第五章 石墨烯與氧化鋅的元件製作 34 5.1石墨烯的成長 34 5.1.1高溫金屬催化成長石墨烯 34 5.1.2石墨烯成長機制與參數調整 35 5.1.3銅箔的預處理 36 5.1.4常壓化學氣相沉積(APCVD)石墨烯 37 5.2石墨烯的轉移 41 5.2.1石墨烯支撐層的製作與旋塗 42 5.2.2黏貼熱解膠輔助轉移 43 5.2.3蝕刻銅箔 45 5.2.4石墨烯的清洗、轉移與脫膠 46 5.2.5 移除支撐層 47 5.3氧化鋅的成長 49 5.3.1常見的氧化鋅成長方式 49 5.3.2原子層沉積(ALD) 49 5.3.3氧化鋅的製程過程與成長原理 50 5.4元件設計與架構 54 5.4.1異質接面雙極性電晶體介紹 54 5.4.2雙極性電晶體特性推導 56 5.4.3元件架構 59 5.5元件的製程 63 5.5.1矽基板的製備 63 5.5.2 Type1石墨烯/矽基板二極體的製作 63 5.5.3 Type2矽基板/石墨烯/單層氧化鋅電晶體的製作 64 第六章 量測結果與討論 66 6.1量測儀器簡介 66 6.2量測方式 67 6.2.1電極的歐姆測試 67 6.2.2基本接面電流對電壓量測 68 6.2.3 Gummel Plot 69 6.2.4電壓響應度 69 6.2.5電流響應度 69 6.2.6響應速度 70 6.3量測結果 71 6.3.1電性量測 71 6.3.2照光量測 87 第七章 結論 97 7.1結論 97 參考文獻 99

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