Bi4Ti3O12-簡稱為BIT為主的材料,在鐵電的特性方面,因為有優越的抗疲勞特性,所以近來廣泛被大家所研究。這是因為鐵電記憶體在實際的運用上,若無法克服經多次讀寫所產生的劣化,將會大大的減低實用性,因而BIT為主的材料在逐漸被大家所研究。
本論文以溶凝膠法旋鍍製作Bi4-xSmxTi3O12的BSmT薄膜,期望在Sm的摻雜後會有比Bi4Ti3O12更好的表現,因此選用了Sm摻雜量在x=0、0.25、0.5、0.75、1,在這幾成分下的變化情形。由於在BIT中有強烈的非等向性,隨著指向的不同所表現的電性也有所不同,應此我們選用Bi4-xSmxTi3O12 在x=0.75下研究其在不同混合指向時的變化。最後我們在Bi4-xSmxTi3O12 在x=0.75下探討在不同膜厚時所發生的電性表現。
在不同的Sm摻雜研究上,我們發現在化學計量比為Bi3.25Sm0.75Ti3O12時,在殘留極化量和抗疲勞性質方面有一最好的表現。且在這成分下所表現的非等向性和BIT與BLT類似,指向上隨C軸指向的增加時,殘留極化量和抗疲勞特性會有下降的發生。在Bi3.25Sm0.75Ti3O12成分下,膜厚在約130nm以上時漏電流以電子熱發散為主,隨膜厚的增加會有漏電流減少的發生。在我們製程下,膜厚約為50nm以下會有電極之間直接導通以歐姆電流型式發生。在膜厚到達約180nm以上時,電製曲線不但有較好的表現,抗疲勞的特性也會有些微的改善。
Bi4-xSmxTi3O12 在x=0.75時,膜厚約180nm以上會有殘留極化量高達13μC/cm2,且經過4×1010極化反轉後,仍然會有很好的抗疲勞表現。在膜厚約為130nm時,有較小的殘留極化量約11μC/cm2,在抗疲勞的性質上也有不錯表現。
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