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研究生: 劉惠雯
Hui-Wen Liu
論文名稱: 高頻鐵釔硼磁性薄膜材料的研究與開發
High Frequency Fe-Y-B Magnetic Thin Films
指導教授: 金重勳 博士
T.S. Chin
口試委員:
學位類別: 碩士
Master
系所名稱: 工學院 - 材料科學工程學系
Materials Science and Engineering
論文出版年: 2007
畢業學年度: 95
語文別: 中文
論文頁數: 88
中文關鍵詞: 高頻磁性薄膜鐵基場退火
外文關鍵詞: high frequency, magnetic thin films, Fe-based, fied-annealed
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  • 本論文的目的為開發高頻頻段通訊用的鐵磁薄膜,成分設計為本實驗室之前所開發的Fe-Y-B系三元塊狀非晶材料,利用直流濺鍍系統以(1)Fe、Y、B三元素濺鍍薄膜、(2)經過磁場退火處理後、(3)加入第四元素濺鍍薄膜,並研究其電性、磁性質和高頻性質。
    在Fe-Y-B初鍍狀態薄膜方面:Y片所占靶材Fe80B20面積為5.6 % -功率40W的薄膜,電阻率860 μΩ-cm、飽合磁化量1.01 T、矯顽場27.3 Oe、鐵磁共振頻率2.1 GHz,在非晶狀態時平行薄面的各方向皆為等向性,此初鍍狀態共振頻率就已高達2.1 GHz。Y片所占靶材Fe80B20面積為5.6 % -功率80 W的薄膜,電阻率340 μΩ-cm、飽合磁化量0.86 T、矯顽場1.5 Oe、鐵磁共振頻率1.0 GHz、低頻導磁率700以上,在非晶狀態時平行薄膜面的各方向皆為等向性,具有很好的軟磁性質且導磁率相當高。
    磁場退火處理後的Fe-Y-B薄膜方面:取自Y片所占靶材Fe80B20面積為9 % -功率60W的薄膜,經過場退火300 o C -30 min處理後,產生5 nm的α-Fe奈米晶;在500 o C -30 min的高溫場退火處理,晶粒仍只有6.7 nm的大小,顯示具有極佳的熱穩定性。經過450 o C -30 min場退火後,飽合磁化量1.07 T、矯顽場66.3 Oe、鐵磁共振頻率大於3 GHz;400 o C - 2 hr場退火後,飽合磁化量1.08 T、矯顽場47 Oe、鐵磁共振頻率2.7 GHz,顯示場退火處理後,奈米晶的形成對Fe-Y-B薄膜的高頻性質提高很多。
    本實驗利用價位低廉的Fe、Y、B三元素濺鍍薄膜,不但具有高電阻率,在高頻特性方面表現不錯,因而相當有潛力應用在製作高頻通訊用的鐵磁薄膜。


    The purpose of this thesis was to develop magnetic thin films for high frequency applications. We made of Fe-Y-B bulk metallic glasses that had developed in our laboratory. The study was divided into three parts: First, the Fe-Y-B ternary system. Second, the Fe-Y-B films which were annealed under a magnetic field after sputtering. Third, Fe-Y-B-M quaternary system. Electrical, magnetic and high frequency properties of these films were evaluated.
    Amorphous Fe-Y-B thin films were sputter-deposited using composite target with Y chip on a Fe80B20 target with area ratio of Y 5.6 %. The films obtained at a dc power of 40 W showed a resistivity ρ ~ 860 μΩ-cm, 4πMs ~ 1.01 T and Hc ~ 27 Oe. The film was also shown to have a high resonance frequency fr ~ 2.1 GHz. No magnetic uniaxial anisotropy was found in the as-deposited films. The thin films obtained at a dc power of 80 W showed a resistivity ρ ~ 340 μΩ-cm, 4πMs ~ 0.86 T and a low Hc ~ 1.5 Oe. The film also had a fr ~ 1.0 GHz and a very high μ’ above 700 which remain nearly constant up to ~ 0.75 GHz.
    The thin films obtained at a dc power of 60 W with Y chip on a Fe80B20 target with area ratio of Y 9 % were taken to anneal under 2500 G. Nano-grained α-Fe appealed after field annealing at 300 oC for 30 min. All films demonstrated a minor crystalline growth and good thermal stability up to 500oC for 30 min. Above 300 oC, a small increase occurred in crystallite size from 5 nm up to 6.7 nm at 500 oC. The film after 450 oC field-annealing for 30 min showed good high frequency property with Ms ~ 1.07 T, Hc ~ 66.3 Oe and fr > 3 GHz. The corresponding values were Ms ~ 1.08 T, Hc ~ 47 Oe, fr ~ 2.7 GHz for film after 400 oC field-annealing for 2 hr. The appearance of nano-grained α-Fe after field-annealing is showed beneficial to promote the high frequency properties.
    The quaternary films showed inferior properties. In summary the Fe-Y-B films showed high resistivity and high frequency properties, which are promising for high frequency applications.

    致謝 Ⅰ Abstract Ⅱ 中文摘要 Ⅳ 目錄 Ⅴ 圖目錄 Ⅶ 表目錄 XI 一、序論 1 1.1 背景 1 1.2 研究動機及目的 1 二、文獻回顧 3 2.1磁性原理簡介 3 2.1.1磁性起源 3 2.1.2 磁異向性 3 2.1.3磁交換作用力的種類 6 2.1.4 鐵磁物質在交變電磁場作用下的電磁性質 9 2.1.5 鐵磁物質內的特殊結構 15 2.2 磁性薄膜電感 19 2.2.1 磁性薄膜考量參數 19 2.2.2 磁性薄膜電感設計 20 2.2.3 磁性薄膜的發展 26 三、實驗步驟與方法 28 3.1 實驗流程 28 3.2 實驗設計 29 3.3 真空濺鍍系統 30 3.4 磁性分析 (樣品震盪測磁儀,Vibrating-sample magnetometer,VSM) 30 3.5 電性分析 (四點探針,Four-point probe method,FPP ) 31 3.6 結構分析 ( X-ray 繞射分析) 32 3.7 成份分析(電子微探儀,Electron Probe X-ray Micro-Analyser,EPMA) 32 3.8 高頻特性分析 (高頻量測儀,High-frequency permeameter,HFP) 34 四、實驗結果與討論 36 4.1初鍍狀態FeYB薄膜分析 36 4.1.1 A組(Y片所占靶材Fe80B20面積為9 %),鍍膜功率為40 W,以不同工作壓力3、6、9、12 mTorr濺鍍薄膜。 38 4.1.2 A組(Y片所占靶材Fe80B20面積為9 %),鍍膜功率為60 W,以不同工作壓力6、9、12 mTorr濺鍍薄膜。 42 4.1.3 B組(Y片所占靶材Fe80B20面積為5.6 %),鍍膜功率為40 W,以不同工作壓力3、6、9 mTorr濺鍍薄膜。 47 4.1.4 B組(Y片所占靶材Fe80B20面積為5.6 %),鍍膜功率為60 W,以不同工作壓力3、6、9、12 mTorr濺鍍薄膜。 52 4.1.5 B組(Y片所占靶材Fe80B20面積為5.6 %),鍍膜功率為80 W,以不同工作壓力6、9、12 mTorr濺鍍薄膜。 56 4.2場退火處理後FeYB薄膜分析 60 4.2.1 固定磁場、場退火持溫時間,探討不同溫度的影響 60 4.2.2 固定磁場、場退火溫度,探討不同持溫時間的影響 66 4.2.3 固定溫度與持溫時間,探討不同外加場強度的影響 73 4.3 初鍍狀態FeYB-M薄膜分析 77 五、結論 82 六、參考文獻 84

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