自組裝分子膜(Self-assembled monolayers, SAMs)經由頭端官能基以化學吸附的方式成長於基板之上，其特性為緻密堆積成長使之擁有良好的規則性二維平面。因此可以利用自組裝分子膜改變金屬、半導體與氧化物等表面性質。近年來已可將成長於金上的自組裝分子膜進行有效的置換反應，且吸引眾人目光。故若能將此技術應用於改質半導體材料的表面特性，將會更加具有實際的應用價值。

為了達此目的，我們將利用聚焦X光與電子束轟擊成長在矽基板表面的自組裝分子膜。並藉由水滴接觸角、掃描式電子顯微鏡、高解析光電子能譜與掃描式光電子能譜術等技術研究改質過程。在經過轟擊聚焦X光或電子束的區域將變得具有活性。此時再成長第二種末端官能基為胺基的自組裝分子於轟擊區域，而胺基的官能基會因靜電吸引力吸附奈米金顆粒在此區域。因此可藉由掃描式電子顯微鏡與掃描式光電電子能譜術觀測奈米金顆粒吸附情形加以驗證微區域改質情況。

Self-assembled monolayers (SAMs) are organic molecules chemisorbed on a substrate surface by a suitable headgroup and formed a well-ordered densely packed 2-dimensional layer. It provides an easy way to modify the surface properties of metal, semiconductor and oxide surfaces. Recently, an exchanging process of different SAMs grown on gold substrate has attracted a lot of attention. Hence, in order to achieve higher technological impact, the exchange reaction occurs on semiconductor surface will be more desirable.

To realize this purpose, we have applied focused soft X-ray and electron beam to pattern silane derived SAM grown on silicon oxide surfaces. The modified surface was then studied by water contact angle, scanning electron microscopy (SEM) and synchrotron radiation based high-resolution X-ray photoelectron spectroscopy (HRXPS). After focused photon and electron beam irradiation, a surface activation procedure was followed to regenerate active surface at the patterned areas. A second SAM with amino functional group was successfully implanted on the patterned areas. This reaction was confirmed by scanning photoelectron microscopy (SPEM) and SEM through gold nanopaticles absorption.

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