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研究生: 吳亮威
Wu, Liang-Wei
論文名稱: 以異硬脂酸銅為前驅物製備奈米銅並配置成奈米銅墨水
Synthesis of Copper Nanoparticles by Using Copper Isostearate as Precursors and Preparation of Copper Inks
指導教授: 談駿嵩
Tan, Chung-Sung
口試委員: 蔣本基
Chiang, Pen-Chi
王竹方
Wang, Chu-Fang
學位類別: 碩士
Master
系所名稱: 工學院 - 化學工程學系
Department of Chemical Engineering
論文出版年: 2017
畢業學年度: 105
語文別: 中文
論文頁數: 76
中文關鍵詞: 異硬脂酸銅鹽奈米銅奈米銅墨水二氧化碳膨脹溶液壓縮流體反溶劑超臨界二氧化碳乾燥導電銅膜
外文關鍵詞: copper isostearate, copper inks, conductive copper films
相關次數: 點閱:3下載:0
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  • 傳統的印刷電路板製程需經過上光阻、曝光、顯影及蝕刻等步驟,步驟繁瑣且蝕刻會產生廢液,若將噴墨印刷技術應用在印刷電路板等電子工業上,則能簡化步驟且不會有蝕刻所產生的廢液。目前奈米銀墨水發展較為成熟,一來銀本身的導電性佳二來對氧的活性較小,但是銀價格較高且離子遷移(Ion migration)較嚴重。銅的導電性與銀相近、價格便宜且離子遷移沒有銀嚴重,具有發展的潛力,但銅較容易氧化,若能克服容易氧化的問題,奈米銅墨水就可以取代奈米銀墨水。
    本研究將氫氧化銅及異硬脂酸於正庚烷中合成異硬脂酸銅(Copper Isostearate, Cu(ISt)2),並以其為前驅物,聚乙烯吡咯烷酮(PVP)為保護劑,維生素C為還原劑,甲醇及無水酒精為溶劑,於還原過程中引入高壓二氧化碳形成二氧化碳膨脹液體,能在溫和的條件下(41 °C及CO2壓力736 psi)短時間(5分鐘)得到粒徑小(平均粒徑12 nm)的奈米銅。
    製備之奈米銅應用部分分為銅墨水及高壓流體反溶劑法成膜。銅墨水方面為將製備之奈米銅懸浮溶液以離心去除雜質,再加入無水酒精及乙二醇以超音波震盪再分散,將之旋轉塗佈於玻璃片上,於燒結後能得到電阻率7.9×10-6 Ω·m之導電銅膜。而高壓流體反溶劑法成膜則是直接將製備好的奈米銅懸浮溶液以高壓二氧化碳為反溶劑沉積在玻璃上並乾燥,於燒結後能得到電阻率6.46×10-3 Ω·m之導電銅膜。


    The traditional printed circuit board process involves coating photoresist, exposure, development, etching and so on. It includes many steps and etching will produce waste. If the inkjet printing technology can be used in printed circuit boards and other electronic industries, the process can be simplified and there will be no waste produced by etching. At present, the development of silver inks is more mature. The first reason is that silver is the most conductive metal. The second reason is that silver is stable under ambient atmospheric conditions. But the price of silver is higher and ion migration is more serious. The conductivity of copper is close to silver, but it’s cheaper and ion migration is not as serious as silver. Copper has the potential to be used in inkjet printing technology, but copper is easier to oxidize. If we can overcome the problem about oxidation, copper inks can replace silver inks.
    In this study, we can synthesize copper isostearate from copper hydroxide and isostearic acid in heptane. We use copper isostearate as precursors, PVP as capping agents, vitamin C as reducing agents, methanol and absolute alcohol as solvents. In the process of reducing reaction, we introduce high-pressure CO2 to form CO2-expanded liquids, so that small copper nanoparticles (average particle size 12 nm) can be obtained in a short time (5 minutes) under mild conditions (41 ° C and CO2 pressure 736 psi).
    The application parts of copper nanoparticle suspensions can be divided into copper ink and preparation of copper films by compressed fluid anti-solvent. To prepare copper ink, first we remove impurities by centrifugation, and then mix copper nanoparticles with absolute alcohol and ethylene glycol. After oscillating the mixed solution using ultrasonic waves, the well- dispersed solutions are copper inks. After sintering the spin-coated film, we can get a conductive copper film with the resistivity of 7.9×10-6 Ω·m. The preparation of copper films by compressed fluid anti-solvent can directly precipitate copper nanoparticles on the glass by high pressure CO2 as anti-solvent and open the valve to leak the liquid. Then dry the film by scCO2. After sintering, we can get a conductive copper film with the resistivity of 6.46×10-3 Ω·m.

    摘要 I ABSTRACT II 謝誌 IV 目錄 V 圖目錄 IX 表目錄 XIII 第一章 前言 1 第二章 文獻回顧 3 2-1 奈米金屬粒子 3 2-1-1製備奈米金屬粒子 3 2-1-2 奈米金屬粒子的聚集 8 2-1-3 奈米金屬粒子之抗氧化方式 10 2-2 利用高壓二氧化碳合成奈米粒子 13 2-2-1 超臨界流體簡介 13 2-2-2 利用超臨界含浸法製備複合材料 14 2-2-3 二氧化碳膨脹液體 16 2-2-4 高壓流體反溶劑法成膜及乾燥 18 2-3 奈米銅及銅墨水相關文獻 19 2-3-1 製備奈米銅相關文獻整理 19 2-3-2 奈米銅粒徑與熔點關係 21 2-3-3 奈米銅墨水的配製 22 第三章 實驗部分 24 3-1 實驗藥品及氣體 24 3-2 實驗分析儀器 25 3-3 實驗流程圖、實驗裝置圖及實驗步驟 28 3-3-1實驗流程 28 3-3-2異硬脂酸銅的合成 29 3-3-3異硬脂酸銅的還原 30 3-3-4(a) 奈米銅墨水的配製及旋轉塗佈 32 3-3-4(b) 高壓流體反溶劑法成膜 33 第四章 實驗結果 34 4-1 異硬脂酸銅的合成 34 4-2 異硬脂酸銅的還原 36 4-2-1 於三溶劑中還原 36 4-2-1(a) 保護劑的量對銅粒徑及轉化率的影響 36 4-2-1(b) 二氧化碳壓力對銅粒徑及轉化率的影響 38 4-2-1(c) 氫氣壓力對銅粒徑的影響 40 4-2-1(d) 溶劑比例對銅粒徑及轉化率的影響 43 4-2-2 於雙溶劑中還原 46 4-2-2(a) 保護劑的量對銅粒徑的影響 46 4-2-2(b) 最低還原劑劑量之探討 48 4-2-2(c) 保護劑加在不同溶液對銅粒徑的影響 49 4-2-2(d) 溶劑比例對銅粒徑的影響 49 4-2-2(e) 還原劑的量對銅粒徑的影響 50 4-2-2(f) 二氧化碳壓力對銅粒徑的影響 51 4-2-2(g) 溫度對銅粒徑的影響 55 4-2-2(h) 實驗設計反應曲面法 56 4-2-2(i) 反應所需時間之探討 61 4-3 銅墨水之配製及旋轉塗佈 62 4-3-1 以無水酒精與第三丁醇為墨水配方 62 4-3-2 以無水酒精為墨水配方 63 4-3-3 以乙二醇為墨水配方 64 4-3-4 以無水酒精與乙二醇為墨水配方 64 4-4 高壓流體反溶劑法成膜及乾燥 65 4-4-1 奈米銅沉積壓力觀察 65 4-4-2 於40 °C沉積銅之實驗 66 4-4-3 於60 °C沉積銅之實驗 68 第五章 結論及建議 69 第六章 參考文獻 70

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