本研究將設計一套能製造高精度微小結構之系統。使用振鏡作為移動加工光路之主要元件，搭配高功率780奈米飛秒雷射作為光源、磁性高精度移動平台以及龍門架構作為整個機台系統主體。
近年來，由於奈米科技、微機構以及生醫科技的進步，對於細小結構的需求日益增大，若使用壓電移動平台製作成品可能無法達到所需要的速度以及產量，所以在此提出由振鏡以及高功率雷射所成的雙光子振鏡系統，以改進整體微影列印製程速度。
系統建置方面。(1)電腦輔助路徑規劃程式：考慮到以往的路徑規劃，大多是用數值方法將數據以向量的方式做補點的路徑規劃，在此增加其他資料與路徑的轉換程式，將一些常用的檔案當作資料來源，用以擴增使用者對於資料的選用的方便性與適用性。(2)振鏡程式介面系統建立：有別於過往移動載台的方式，使用振鏡將會考慮到角度轉換長度問題，此研究會專注於此以程式換算方式精進其還原度至設計時的模樣。(3)曝光路徑優化：由於使用與以往不同的系統，造成的線寬、劑量累積以及路徑重疊等需求重新計算，此研究會建立出符合雙光子振鏡系統的製程參數。

In this study, we will design a system which can manufacture high-resolution and tiny structure. The system was established by a high-power 780nm wavelength Ti-sapphire laser, which can achieve rapid manufacturing. Also, there was a high-resolution galvanometer that can provide a precise way to move the voxel. There are three high-precision stages and the gantry frame designed by ourselves.
Recently, due to the improvement in nanotechnology, micromechanical, and biology, the demand of microstructure is getting higher and higher. Although the two-photons polymerization(TPP) piezo system can deal with precision structures, it would cost a lot of time on making larger structures. If there were only a TPP piezo system, it can’t reach the demand and speed. Therefore, this study will develop a TPP scanning system to solve those gaps and fasten the whole process.
We have three new ideas for this system. First, computer-aided path planning system: it’s a big problem for users when programming a new path data. The most common way is calculating the coordinate point and filling the point data in the vector. However, it is limited to the structure that could be presented by the formula. This system will provide a new way to calculate the path data with some data like JPG, BMP, and STL. Second, setup of the scanning system interface: the scanner works by changing the angle of a galvanometer, so we need a system to convert the scanning angle to linear distance and control all of the components in the system. Third, optimization of the process: there are some parameters like the voxel and dose accumulation needed to recalculate to fit this system.

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