本研究目的為探討氧化鉻(CrOx)薄膜在可見光波段及近紅外光波段之光學特性，以獲得在可見光波段650 nm位置吸收效果最佳(消光係數大)且在近紅外光波段1400 nm位置濾光效果最佳(穿透率低)之參數，應用在單層吸收膜及衰減濾光片上。
本研究使用電子束蒸鍍系統鍍製氧化鉻薄膜，以光譜儀量測反射率及穿透率，再使用數值方法分析光學常數。接下來以SEM及XRD檢測膜層結構、以XPS檢測組成成份及使用四點探針儀量測片電阻值。
本研究探討的製程變因包含製程壓力(通氧量)、製程溫度及離子源的使用與否。在製程壓力部份，隨通氧量增加，金屬相降低，薄膜穿透率逐漸上升；在製程溫度部份，在200 ℃時，穿透率略為下降，並未出現柱狀結晶；在離子源製程部份，使用Ar或O2離子源助鍍後，穿透率均有上升情形，其中以O2離子源較為明顯，膜層柱狀結構較少，膜層堆積緻密程度有所提升。由實驗結果得知，在製程壓力1×〖10〗^(-3) Pa、製程溫度200 ℃、未使用離子源助鍍條件下鍍製之氧化鉻薄膜，在650 nm處消光係數為0.048；在1400 nm處穿透率為68%，為本實驗獲得之最佳參數。

The purpose of this study is to investigate the optical properties of chromium oxide film in visible light and near infrared (NIR) region, to obtain the best absorbing effect (high extinction coefficient) at 650 nm and best filter effect (low transmittance) at 1400 nm. It can be applied in monolayer absorbing film and neutral density filter (ND filter).
The chromium oxide film is deposited by electron-beam evaporation system. The reflectance and transmittance are measured by spectrometer, then numerical method is used to analyze optical constants. The structure is detected by SEM and XRD; the composition is detected by XPS and sheet resistance is measured by four-point probe.
In this study, the process parameters include process pressure (oxygen flow rate), process temperature and ion beam assisted deposition (IAD). For the process pressure, the metal phase decreases and the transmittance increases with the oxygen flow rate. For the process temperature, there is a slight decrease in transmittance when the process temperature is 200 ℃, and columnar crystals can not be found in the structure. For the IAD, the transmittance increases after the Ar or O2 IAD process is used, the O2 IAD process is more obvious. The columnar structure in the film under O2 IAD process is less than the film without O2 IAD process, so the density of film deposition has increased. The results show that the best parameter for the process pressure is 1×〖10〗^(-3) Pa; for the process temperature is 200 ℃, without IAD process. At 650 nm, the extinction coefficient is 0.048; at 1400 nm, the transmittance is 68%.

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