本實驗以反應式射頻磁控濺鍍法製備HfNbSiTaZr多元碳氮化物薄膜，探討不同甲烷與氮氣流率以及施加不同基板偏壓後對薄膜微結構、機械性質及磨耗性質的影響。實驗結果顯示在未施加基板偏壓下，多元碳氮化物薄膜均呈現FCC固溶結構，在碳含量約為 37.3 at%，氮含量約為 18.0 at%的薄膜中，有較高的硬度27.3 GPa且較低的摩擦係數0.39。以此成分的薄膜為基礎，施加基板偏壓後，薄膜仍維持FCC固溶結構，結構變得更緻密；硬度雖沒有提升，但在球對盤磨耗試驗中，摩擦係數降至0.15，磨耗速率降至0.2 × 106 mm3/Nm。大氣退火方面，薄膜施加偏壓 50 V且在退火溫度 500 C時，氧化層厚度最薄約 226 nm。由此可見，與歷屆學長姐的碳氮化物薄膜相比，在摩擦係數與磨耗速率有較好的表現。

Multi-element carbon nitride films based on high-entropy alloys have received lots of attention. In this study, multielement (HfNbSiTaZr) carbon nitride films were designed and deposited at 400 ℃on Si wafers by RF reactive magnetron sputtering in the gaseous mixture Ar + N2 + CH4. By changing nitrogen flow ratio, methane flow ratio and substrate bias, crystal structure, microstructure, hardness and oxidation resistance have been investigated.
The results of crystal structure indicate that films with substrate bias or without substrate bias all exhibit FCC structure. Besides, the films with the increasing substrate bias contain denser microstructure but decreasing hardness. In ball-on-disc wearing test, the coatings increasing substrate bias show lower friction coefficient 0.15 and lower wearing rate 0.2 × 106 mm3/Nm. In addition, the film of 50 V substrate bias has good oxidation resistance. After the air annealing at 500 C for 2 h, the oxide layer is just 226 nm on the surface of the coating.
The research illustrates the excellent potential of multi-element (HfNbSiTaZr) carbon nitride coating for industrial applications.

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