本篇論文研究軟X光波段(波長1nm~25nm)多層膜反射鏡之設計與實做之過程，除了做軟X光波段反射鏡的特性模擬外，並利用多種儀器如RF/DC磁控濺鍍系統、α–Step、SIMS、低略角X光反射測量儀以及AFM等儀器來做薄膜反射鏡的製作以及膜層的特性檢測等，最後在於同步輻射中心作軟X光反射率之量測。

以實做來說，除了必須建立於真空系統中材料的沈膜速率的條件之外，關於粗糙度以及多層膜元素的檢測也是必要的，因此在本研究中，我們首先確立了Mo和Si個別在不同濺鍍槍瓦數下以及氬氣壓力之沈膜速率，由於一開始的沈膜速率量測是使用α–Step，因此接下來我們使用了低略角X光反射率量測以及SIMS來對我們所得到的沈膜速率以及膜厚做交互的驗證，並檢驗Mo/Si多層膜的存在，再來我們利用AFM對試片做表面量測，觀察試片的粗糙度以及試著改變製鍍條件來降低薄膜的粗糙度，最後再將試片做軟X光反射率的量測，並觀察實驗所得結果並與模擬結果比較討論。

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