研究生: |
張啟禮 Chang, Chi-Li |
---|---|
論文名稱: |
利用離子束濺鍍法鍍製奈米多層膜其低溫機械損耗抑制效應與退火效應之研究 Suppression effect and annealing effect on cryogenic mechanical loss of nano-layer coatings deposited by ion beam sputtering |
指導教授: |
趙煦
Chao, Shiuh |
口試委員: |
李正中
Lee, Ceng-Chung 陳至信 Chen, Jyh-Shin |
學位類別: |
碩士 Master |
系所名稱: |
電機資訊學院 - 光電工程研究所 Institute of Photonics Technologies |
論文出版年: | 2018 |
畢業學年度: | 107 |
語文別: | 中文 |
論文頁數: | 73 |
中文關鍵詞: | 奈米多層膜 、機械損耗 、低溫 、二氧化鈦 、二氧化矽 、退火 、抑制效應 |
外文關鍵詞: | Nano-layer, Mechanical, Cryogenic, Titania, Silica, Annealing, Suppression effect |
相關次數: | 點閱:1 下載:0 |
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光學薄膜的熱擾動是高精度干涉儀測量的限制之一。為了測量微弱的信號如重力波,應盡可能降低熱擾動,以提高檢測靈敏度。根據Fluctuation-Dissipation theorem,薄膜的熱擾動與材料的機械損耗成正比關係。因此,我們只要量測材料的機械損耗,就可以得知由薄膜引起的熱擾動影響。本實驗室致力於研究材料的機械損耗以降低熱擾動。
我們透過離子束濺鍍法研究二氧化矽和二氧化鈦薄膜。對於傳統的高反射鏡,二氧化矽是不可缺少的低折射率材料。然而,二氧化矽具有高的低溫機械損失,會導致高的熱擾動影響。因此,我們將二氧化鈦做為二氧化矽薄膜的blocking layer。當減少二氧化矽的膜層厚度時,由於長範圍Two-level system的轉變被消除了,使二氧化矽的低溫損耗產生抑制效果。
對於另一種材料,二氧化鈦是一個難以在高溫下退火的材料。因此,我們將二氧化矽做為二氧化鈦的blocking layer。藉由此方式進行退火,二氧化鈦的結晶溫度有顯著提高。在最小膜層厚度的樣品中,其退火可以增加到600℃而不結晶。最重要的是該樣品在600℃退火機械損耗可以更有效地被減少。
Thermal noise from the optical coating in the cavities of the interferometer is the limiting factors for high-precision measurement. In order to measure weak signals such as gravitational-wave, the noise should be reduced as much as possible to improve detection sensitivity. According to Fluctuation-Dissipation theorem, the thermal noise is proportional to the mechanical loss of materials. Therefore, as long as we measure the loss, we can determine the noise effect of the films. The laboratory is committed to research the loss of materials to reduce the noise of the measurement system.
We investigated the silica and the titania films for high reflection coating by ion beam sputtering. For traditional high reflection mirrors, silica is an indispensable low refractive index material. However, silica has a high cryogenic mechanical loss and hence contributes to high thermal noise. Therefore, we stacked titania as a blocking layer for silica films. When reducing the thickness of the silica layers that eliminates the transitions of the long-range two-level systems. There had a suppression effect in cryogenic loss of silica layers.
In another material, titania is a material that difficult to anneal at high temperatures. Therefore, silica becomes a blocking layer for titania films. Annealing in this way, the crystallization temperature of titania was significantly improved. In the case of the sample which has the smallest film thickness. Annealing of the sample could increase to 600oC without crystallization. The most important is that the sample which annealing at 600oC could effectively decrease the mechanical loss.
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