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研究生: 林仲桓
Lin, Chung-Huang
論文名稱: 利用角解析光電子能譜及低能量電子繞射研究鉛(100)薄膜在鍺(100)基底上之電子結構與薄膜性質
Study of the electronic structure and thin film properties of Pb(100) on Ge(100) by Angle-Resolved Photoemission(ARPES) and LEED
指導教授: 唐述中
Tang, Shu-Jung
口試委員: 鄭弘泰
鄭澄懋
唐述中
學位類別: 碩士
Master
系所名稱: 理學院 - 物理學系
Department of Physics
論文出版年: 2011
畢業學年度: 99
語文別: 中文
論文頁數: 46
中文關鍵詞: 鉛(100)薄膜角解析光電子能譜低能量電子繞射量子井態
外文關鍵詞: Pb(100) thin film, ARPES, LEED, Quantum well state
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  • 我們利用金原子在鍺(100)基底上形成的c(8x2)結構當作緩衝層,成功地在零下150℃製備原子平坦的鉛(100)薄膜;並利用角解析光電能譜術測量了鉛(100)薄膜量子井態的能帶結構。位在鉛(100)薄膜Γ ‾位置的量子井態能量與厚度的關係可以利Bohr-Sommerfeld量子化規則來計算。此外,我們還發現了鉛(100)的薄膜在升溫至室溫後,會形成兩個領域同時存在的六角形結構,並且此結構是鉛(111)面結構的兩倍大。量測此特殊六角型鉛結構的能帶結構,我們發現在表面布里淵區的邊界上能帶有著分裂的現象。


    We successfully grow the Pb(100) thin films on the substrate of Ge(100) by using Au/Ge(100)-c(2x8) reconstructed surface as a template at T=-150℃. Through the thickness dependence of quantum-well-state energies measured by photoemission spec-
    troscopy, we found the Pb(100) thin film grow layer-by-layer. By checking the Low Energy Electron Diffraction (LEED) pattern, we observed that the square structure of Pb(100) thin film trans-
    forms to a hexagonal structure after being annealed to room temperature, but the size of the special hexagonal lattice was different from that Pb(111) films.

    第一章 簡介...............................................................1 第二章 實驗技術與準備.....................................................3 2.1光電子能譜................................................................3 2.1.1三步驟模型.............................................................4 2.1.2角解析光電子能譜.......................................................9 2.2電子動能分析儀...........................................................11 2.3超高真空系統.............................................................13 2.4基底的準備...............................................................14 2.4.1濺鍍槍................................................................14 2.4.2鍺(100)表面重構.......................................................15 2.4.3低能量電子繞射儀......................................................17 2.5薄膜蒸鍍.................................................................20 2.5.1蒸鍍槍................................................................20 2.5.2石英晶體微天平........................................................21 2.5.3金的緩衝層確認........................................................22 第三章 表面態與量子井態..................................................25 3.1表面態...................................................................25 3.2量子井態.................................................................27 3.2.1 Bohr-Sommerfeld相位模型..............................................29 3.2.2量子數................................................................31 第四章 實驗結果與分析....................................................32 4.1鉛薄膜的層狀成長和量子井態能階分析.......................................32 4.1.1層狀成長..............................................................32 4.1.2量子井態能階分析......................................................35 4.2正方形與六角形的鉛薄膜...................................................36 4.2.1正方形的鉛薄膜........................................................36 4.2.2六角形的鉛薄膜........................................................38 4.3鉛薄膜原子結構的模型.....................................................41 第五章 結論..............................................................44 參考文獻....................................................................46

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