近年來微機電系統 MEMS 漸成為世界的重要產業科技之ㄧ，其體積小、低耗能的優點，使 MEMS 產品應用愈來愈普遍。從 ADI 加速度計到德儀的數位微面鏡（DMD）運用在投影機，使得 MEMS 的元件更受到重視。MEMS 的製程無法標準化，因而需針對不同元件設計出不同的製程，如此會造成成本較高與製造複雜。若利用現有 IC 標準製程與高良率，將 MEMS 與 IC 的技術整合將會使 MEMS 元件更具有競爭力，此即為 CMOS-MEMS 技術。本研究採用 TSMC 0.35 μm 2P4M 製程進行加速度計設計，此加速度計與其他 CMOS-MEMS 加速度計最大差異點在於不採用感測臂作為感測架構，而是將質量塊也作為上電極，如此可減少元件面積進而降低成本。

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