批次控制是針對IC製程特殊的生產型態所發展出來之製程回饋控制工具，由於IC製程的投入變數可調整範圍通常很窄，因此製程之投入-產出模型大多用一靜態 (static) 線性模型來描述之。然而，實際製程之投入-產出大多為動態 (dynamic) 系統，因此，使用double EWMA控制器來微調動態漂移系統是否可確保製程穩定收斂是十分重要之研究課題。在兩種最常見的動態模型之假設下，考慮製程發生老化現象，本文將分別探討 double EWMA控制器的穩定條件，以及可確保製程穩定收斂的機率高於給定之機率值的最適樣本數。由本文可知，在一般常見的製程干擾下，採用double EWMA控制器來微調製程，均可找到合適的折扣因子來確保製程穩定收斂。

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