在本論文中,我們設計並合成出以含矽雙□基為架構之新型光分解單體,並在單體的末端引入一級的胺基;將此光解性單體與對苯二醯氯在100度下反應,以四氯乙烷為溶劑,成功合成出具光分解性質的聚醯胺高分子;在紫外光照射下,光敏感聚醯胺高分子會經由特殊光化學反應,使高分子主鏈斷裂;此新型光解性高分子材料在光顯影與微電子應用上具相當的潛力

Abstract
A symmetric organic diamine containing the bis[(N,N'-diphenyluredio)-methyl]silane skeleton was designed as a new type of photodegradable unit. Polymerization of this monomer with isophthaloyl dichloride in tetrachloroethane at 100 。 gave polyamides in 90% yield. Upon irradiation by UV light, this photosensitive polyamides underwent fragmentation through main-chain scission. These unprecedented type of polymers possess potential to be developed as new materials for positive photo-lithography and micro-electronics with economic value.

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