本篇論文主要研究方向為耐高溫薄膜的製程及測試，此實驗乃是根據專利發明人趙煦教授、黃承揚以及顧浩民，所提出之專利”一種可用於太陽電池之耐高溫光學薄膜”[1]，其專利內容為一具有耐高溫之光學薄膜的方法及製程，將此專利製程之構想引入本文，本論文採用離子束濺鍍系統製作出多層光學薄膜，再以感應耦合電漿蝕刻系統，蝕刻出所謂熱應力釋放通道，透過高溫加熱爐模擬高溫環境，測試不同薄膜邊長之光學薄膜，所能夠承受的高溫，不會因為熱應力造成薄膜變形剝落的問題。根據實驗結果了解到，光學薄膜的邊長大小 與耐熱溫度有其反比關係，也就是當薄膜的邊長越大，能夠承受的溫度也就越低，當環境溫度造成之熱應力，超過了光學薄膜所能承受的應力範圍，光學薄膜就會產生變形剝落。而本論文最後目標為根據上述之實驗結果，實際應用於藍光二極體，因為在氮化鎵之橫向磊晶製程時，其製作緩衝層需要經過1150oC的高溫，因此將所做出能夠耐1150oC之藍光高反射鏡，實際應用於藍光LED提升其發光效率。

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