研究生: |
簡士傑 Jian, Shih-Jie |
---|---|
論文名稱: |
線型大氣壓低溫電漿之研究 Research of Atmospheric Pressure Line-shaped Cold Plasma |
指導教授: |
寇崇善
Kou, Chwung-Shan |
口試委員: | |
學位類別: |
碩士 Master |
系所名稱: |
理學院 - 物理學系 Department of Physics |
論文出版年: | 2009 |
畢業學年度: | 97 |
語文別: | 中文 |
論文頁數: | 73 |
中文關鍵詞: | HMDSO 、電漿 |
外文關鍵詞: | HMDSO, plasma |
相關次數: | 點閱:1 下載:0 |
分享至: |
查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報 |
目前電漿的鍍膜製程仍是在真空的環境下進行,在真空系統下作業需耗費很長的時間才能做完一個流程,且製作腔體需要很高的成本,因此本實驗主要的研究方向是利用介質屏障放電(dielectric barrier discharge,DBD)進行大氣輝光放電,以氦氣做為電漿源,使有機矽化合物-六甲基矽氧烷(Hexamethyldisiloxane,HMDSO)解離後與基材鍵結形成矽氧膜,同時可藉由控制碳氫基團(C-Hx)的量,使膜的性質為有機性或無機性、疏水性或親水性。本研究並探討以此膜做為液晶配向膜的可行性。藉由控制膜的表面能大小去控制液晶的預傾角大小,實驗結果顯示HMDSO膜配合刷磨式配向技術可達到水平配向效果。
1. G. S. Selwyn, H. W. Herrmann, J. Park,and I. Henins,Materials Processing using an Atmospheric-Pressure Plasma Jet,Physics Division Progress Report 1999–2000
2. T. Uchida,M. Hirano,and H. Sasaki:Liq.Cryst.5(1989)1127
3. Y. Kawanishi,T. Tamaki,M. Sakuragi,T. Seki,Y. Suzuki,and K. Ichimura: Langmuir 8(1992) 2601
4. Y. Kawanishi, T. Takimiya ,and K. Ichimura: Polym. Mater. Sci. Eng. 666(1992)
5. S.J. Rho,D.-K. Lee,H. K.Baik,J.-Y. Hwang,Y.-M.Jo,and D.-S. Seo,Thin Soild Films 420-421,259(2002)
6. 李金揚、劉品均,電漿束液晶配向製程設備技術現況,機械工業雜誌 270期 P.40~P.46
7. 原著:Skoog、審譯:林敬二,儀器分析,第五版
8. 陳宏彬,橢圓偏光儀之原理與應用,儀科中心簡訊 80 期:中華民國 96 年 4 月 30 日出版
9. A. Jay Palmer,A physical model on the initiation of atmospheric-pressure glow discharges,Appl. Phy. Lett.,25,p138(1974)
10. Nicolas Gherardi and Francoise Massines,Mechanisms Controlling the Transition from Glow Silent Discharge to Streamer Discharge in Nitrogen,IEEE Trans. On Plasma Sci., 29,p536(2001)
11. P.K. Sharma, K. Hanumantha Rao,Analysis of different approaches for evaluation of surface energy of microbial cells by contact angle goniometry,Advances in Colloid and Interface Science 98,p.341-463(2002)
12. R. Watanabe ,T. Nakano ,T. Satoh ,H. Hatoh ,Y. Ohki,Plasma-Polymerized Films as Orientating Layers for Liquid Crystals,JJAP,26,3,p.373-376(1987)
13. K. Takatoh,M. Haseawa,M. Koden,N. Itoh,R. Haseawa,M. Sakamoto,Alignment Technologies and Applications of Liquid Crysatl Devices
14. Z. Rżanek-Boroch, K. Schmidt-Szałowski, J. Janowska, K.Dudziński, A. Szymańska, M. Misiak,THIN FILMS OBTAINED BY PE-CVD METHOD FROM HEXAMETHYLDISILOXANE UNDER ATMOSPHERIC PRESSURE,Warsaw University of Technology, Faculty of Chemistry, Noakowskiego 3, 00-664 Warsaw, POLAND
15. F. Ben´ıtezU, E. Mart´ınez, J. Esteve,Improvement of hardness in plasma polymerized hexamethyldisiloxane coatings by silica-like surface modification,Thin Solid Films 377-378(2000)109-114
16. V. Raballand, J. Benedikt, and A. von Keudell,Deposition of carbon-free silicon dioxide from pure hexamethyldisiloxane using an atmospheric microplasma jet,App. Phy. Lett.,92, 091502 (2008)
17. G.F. Leu, A. Brockhaus, J. Engemann,Diagnostics of a hexamethyldisiloxaneyoxygen deposition plasma,Surface and Coatings Technology 174 –175 (2003) 928–932
18. R.Watanabe ,T.Nakano ,T.Satoh ,H.Hatoh and Y.Ohki,Plasma-Polymerized Films as Orientating Layers for Liquid Crystals,JJAP,Vol.26,NO.3,1987,373-376
19. M.Goujom,T.Belmonte,G.Henrion,OES and FTIR diagnostics of HMDSO/O2 gas mixtures for SiOx deposition assisted by RF plasma,Surface & Coatings Technology 188–189 (2004) 756–761
20. M.T.Kim,J.Lee,Characterization of amorphous SiC:H films deposited from hexamethyldisilazane,Thin Solid Films 303 (1997) 173-179
21. 經濟部技術處,LCD電漿束液晶創新配向技術,科技走廊(發佈日期)2006/07/21 http://doit.moea.gov.tw/news/newscontent.asp?ListID=0712&TypeID=64&CountID=15&IdxID=9&top_cid=
22. B.M.Penetrante , M.C.Hsiao , B.T.Merritt , G.E.Vogtlin ,and P.H.Wallman,Pulsed corona and dielectric-barrier discharge processing of NO in N2,Appl. Phys. Lett. 68 (26), 24 June 1996
23. Thomas B. Reed,Induction-Coupled Plasma Torch,Journal of Applied Physics,Vol 32,Number 5(1961)
24. A.Schutze,J.Y.Jeong,S.E.Babayan , J.Park , G.S.Selwyn ,and R.F.Hicks,The Atmospheric-Pressure Plasma Jet: A Review and Comparison to Other Plasma Sources,IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 26, NO. 6, DECEMBER 1998