研究生: |
胡智喬 Hu, Chih-Chiao |
---|---|
論文名稱: |
提升量子點與光阻材料之相容性並於彩色濾光器的應用 Improvement of Compatibility between Quantum Dots and Photoresist Materials and Application in Color Filters |
指導教授: |
陳學仕
Chen, Hsueh-Shih |
口試委員: |
鍾淑茹
Chung, Shu-Ru 王冠文 Wang, Kuan-Wen |
學位類別: |
碩士 Master |
系所名稱: |
工學院 - 材料科學工程學系 Materials Science and Engineering |
論文出版年: | 2019 |
畢業學年度: | 108 |
語文別: | 英文 |
論文頁數: | 79 |
中文關鍵詞: | 量子點 、光阻液 、彩色濾光片 、黃光微影 、微米圖案 |
外文關鍵詞: | quantum dots, photoresist, color filter, photolithography, mirco-pattern |
相關次數: | 點閱:1 下載:0 |
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本研究主要是藉由利用兩性材料當作鏈接劑將量子點進行包覆,增加量子點與光阻溶劑的相容性,進而應用於彩色濾光片中。因量子點表面配體與光阻溶劑的極性差異,導致混合過程會產生混濁沉澱,故需將量子點作包覆來改善相容性。在包覆過程中,需調控量子點表面配體含量、反應溶劑的選擇及鏈接劑的使用量等參數來達到包覆的效果。經鏈結劑包覆後的量子點和極性光阻溶劑(PGMEA)的相容性有明顯提升,溶液澄清且無沉澱物產生。量子點光阻溶液的光學性質在常溫及60℃環境下能擁有良好的穩定性。再經由黃光微影的製程,製作出量子點彩色濾光片,其光學性質也具有良好的熱及光穩定性。且藉由黃光微影的方式,能將量子點彩色濾光片的圖案做到約150至50微米。希望此量子點彩色濾光片未來能應用在micro-LED顯示器中。
In this study, we did the QDs modification to improve the compatibility between quantum dots (QDs) and photoresist (PR) systems with binders which is amphoteric materials as the linker. There are some factors have to control, such as ligand content on QDs surface, selection of reaction solvent and usage of binders, the QDs can be encapsulated with binders. After binder encapsulation process, the QD-binders are successfully dispersed into PGMEA which is one of the polar solvents for PR systems. QD-binder solutions have good performance at thermal stability. QD-binder solutions are mixed with PR systems to form QD-PR films (the same as QD-CF). In addition, the QD-PR films are able to be fabricated by photolithography process and they have good optical performance in thermal and photo stability. Finally, QD-PR films can be patterned in mirco-scale and the size of pattern can reach about 50 to 150 μm.
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