研究生: |
毛晨馨 Mao, Chen Hsing |
---|---|
論文名稱: |
鉑金屬層對矽晶圓直接接合之研究 |
指導教授: |
胡塵滌
Hu, Chen-Ti |
口試委員: |
吳錫侃
楊聰仁 李三保 |
學位類別: |
碩士 Master |
系所名稱: |
工學院 - 材料科學工程學系 Materials Science and Engineering |
論文出版年: | 2013 |
畢業學年度: | 101 |
語文別: | 中文 |
論文頁數: | 104 |
中文關鍵詞: | 晶圓接合 、鉑金屬層 、直接接合 、表面處理 |
外文關鍵詞: | Wafer Bonding, Pt film, Direct Bonding, UV/O3 |
相關次數: | 點閱:2 下載:0 |
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本論文將經過溼式化學清洗過(去除原生氧化層)之矽晶圓表面濺鍍鉑金屬層,經過表面清洗及表面改質,直接接合與施壓退火,接合後晶圓對探討接合之強度、電性以及接合界面性質。
將已鍍製鉑金屬層之晶圓,經過不同溼式化學清洗,觀測表面親、疏水性質。加入紫外線臭氧清洗機對鉑晶層表面做改質,並觀察表面親、疏水性質的改變,尋求有關鉑金屬層表面清洗及改質之製程。
本實驗分為兩個部分,其一於單一矽晶圓表面鍍上鉑金屬層,經過濕式化學表面清洗及紫外線臭氧清洗機表面改質後,與未鍍上金屬層並經化學表面清洗之另一矽晶圓直接接合,於不同氣氛、溫度下做退火處理。探討晶圓對接合後之強度、電性、接合界面之性質變化。
其二,將兩片矽晶圓皆濺鍍上鉑金屬層,經濕式化學表面清洗以及紫外線臭氧清洗機表面改質後,直接接合,於不同氣氛、溫度、時間下退火處理。比較與討論接合界面性質之變化。
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