現今半導體廠面對的環境可說是瞬息萬變，市場的競爭激烈而且變化頻繁，產能擴充的投資計劃動輒上百億，此時晶圓廠產能規劃模型的建構完整與否，將嚴重影響到管理者的決策速度及決策品質。通常產能規劃模型建構的過程中，需輸入許多的生產參數，如機台群組的定義、機台可加工時間、生產線技術員之效率、每一加工程式理想之每小時產出晶片數等，其中變異最大的參數便是每一加工程式理想之每小時產出晶片數(WPH)，同時WPH也是製造生產人員最為關心的項目之一。
本研究的目的是建構一適用於半導體晶圓廠產能規劃模型中機台WPH即時監控系統，透過製造執行系統所記錄貨批加工之開始及結束時間，輔以半導體設備通訊標準所蒐集機台於加工過程中對該程式每一步驟的加工時間，以統計製程管制的方法定義出機台各加工程式WPH的基線、上管制界線、下管制界線，並透過資訊系統建立異常管理系統，俾使生產線管理者能夠於較短的時間內獲知異常已發生，採取必要之補救措施並找出發生的“根本原因”，並將實際值回饋給晶圓廠產能規劃模型，以增加產能規劃模型之準確度。

Recently the semiconductor industry is facing dramatic changes owing to global competition and technology reaching post-Moore’s law. The investment of capacity expansion usually takes huge amount, which is over 3 Billion US$ for advanced 300mm fab. Therefore, the completeness and effectiveness of fab capacity planning model will absolutely affect the response speed and decision quality of top management. Many parameters need to be inputted into the capacity planning model during the construction stage, for example, the definition of tool group, tool available time, the efficiency of operator, and ideal throughput for each production recipe. The most critical parameter among them is WPH (Wafer Per Hour) and the recipe WPH is the most concerned index for manufacturing group.
This thesis aims to construct an adequate “Tool WPH Monitor and Management System” for semiconductor wafer fab capacity planning model. We analyze the records of lot’s process from begin to end in manufacturing execution system and the process time of every step collected from the semiconductor equipment communication standard. Then, we propose using the statistical process control method to define the baseline and upper/lower control limit of WPH control chart. This abnormality management system will help the manager of production line to diagnose the abnormal situation to adopt the containment action and remove the root cause. The updated recipe WPH will be feedback to capacity planning model so as to increase its accuracy. We validate this approach in a fab in Taiwan.

中文部分
吳振寧，“台灣半導體廠設備管理指標模型建立與評比”，國立清華大學工業工程與工程管理學系碩士論文，1999。
邱泉樺、王興仁、張傑鈞、張世昌，「The Tool Efficiency Monitor System Creation of Furnace Area in Semiconductor Manufacturing」，2002 TSIA半導體製造技術研討會，新竹，2002。
孫銘新，“台灣晶圓製造廠設備管理標竿 ”，國立清華大學工業工程與工程管理學系碩士論文，1998。
徐世輝譯，Douglas C. Montgomery著，品質管理，高立圖書有限公司，台北縣，2002。
張正賢譯，統計品質管制(第二版)，Douglas C. Montgomery著，華泰書局，台北市，1997。
陳建平等譯，J.M.Juran and Frank M.Gryna著，品質管理(第三版)，美商麥格羅•希爾國際股份有限公司(台灣)，台北市，1999年。
傅和彥、黃士滔著，品質管理：觀念、理念與方法(第三版)，前程企業管理有限公司，台北縣，2004。
鄭春生著，品質管理，三民書局股份有限公司，台北市，1995。
駱江州，“晶圓製造廠機器產能效率提昇改善之個案研究”，國立清華大學工業工程與工程管理學系碩士論文，2001。
戴久永著，如何做好SPC，遠流出版事業股份有限公司，台北市，1993。
簡禎富、施義成、林振銘、陳瑞坤，半導體製造技術與管理，國立清華大學出版社，新竹市，2005。

英文部分
Bowen, C.L., "Integrated Statistical Process Control as a Productivity Improvement Tool", Advanced Semiconductor Manufacturing Conference and Workshop, 1999 IEEE/SEMI, 8-10 Sept. 1999, Page(s):430 - 431.
Hopp, W.J. and M.L. Spearman, Factory Physics: Foundations of Manufacturing Management, McGraw-Hill, 2000.
Hunt, S. J., “A manufacturing driven real-time statistical process control implementation model,” International Semiconductor Manufacturing Science Symposium, 41-45, IEEE/SEMI International, 1989.
J. K. Robinson, “Understanding and Improving Wafer Fab Cycle Times,” Semiconductor FabTech, Volume 17, April, 2002
Leachman, R. C. and Hodges D. A., “Benchmarking semiconductor manufacturing,” IEEE Transactions on Semiconductor Manufacturing, 9, 158-169, 1996.
Leachman, R.C. and Hodges, D.A. “Benchmarking semiconductor manufacturing,” Integrated Reliability Workshop Final Report, 1997 IEEE International , 1-6, 1997.
Leachman, R.C., “Closed-Loop Measurement of Equipment Efficiency and Equipment Capacity,” IEEE Transactions on Semiconductor Manufacturing, 10, 84-97, 1997.
Leachman, R.C.; Busing, D.P.; Ting-Yun Liu; Moore, D., “Equipment efficiency improvement: the new frontier, ” Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium, 39-40, 1997.
Nelson, L. S., “Intepreting Shewhart control charts,” Journal of Quality Technology, 17, 114-116, 1985.
Nelson, L. S., “The Shewhart control chart-tests for special causes,” Journal of Quality Technology, 16, 237-239, 1984.
Richard R. Clements, Statistical Process Control and Beyond, Robert E. Krieger Publishing Company, Florida, 1998.
SEMATECH, Overall Equipment Effectiveness (OEE) Guidebook Revision 1.0, SEMATECH Technical Reports, 1995.
Uzsoy, R., C. Y. Lee, and L. A. Martin-Vega, “A review of production planning and scheduling models in semiconductor industry. Part I: System characteristics, performance evaluation and production planning,” IIE Transactions, 24(4), 47-60, 1992.
Uzsoy, R., C. Y. Lee, and L. A. Martin-Vega, “A review of production planning and scheduling models in semiconductor industry. Part II: Shop floor control,” IIE Transactions, 26(5), 44-54, 1994.
Western Electric company, Statistical Quality Control Handbook, Indianapolis, Indiana：Western Electric Co. Inc., 1958.