鑽石被公認為最重要的工程材料之一，它具有硬度最大、散熱最快和耐腐蝕等極佳的物理及化學性質。雖然CVD鑽石擁有如此出色的性質，但是其厚度的不均勻性及粗糙的表面，限制了鑽石膜在工業上的應用。
本論文以不同的研磨液對CVD鑽石進行化學輔助機械式拋光，研磨液由強氧化劑與鑽石磨粒所組成。加工過程中，環境溫度不超過90 ℃，鑽石膜與旋轉的陶瓷盤面互相貼合，並左右平移，進行拋光。使用表面輪廓儀、原子力顯微鏡及掃描式電子顯微鏡來觀測拋光前與拋光後表面的品質。根據實驗結果，以過硫酸鉀(K2S2O8)為研磨液可達到最大的材料移除率，而過錳酸鉀(KMnO4)則可獲得最佳表面粗度值。利用過硫酸鉀進行粗拋光，再以過錳酸鉀細拋光，可使全區域的鑽石膜表面粗糙度最佳。此法於5小時內可把平均的表面粗糙度Ra降到10 nm以下。

Diamond has been well recognized a strategic engineering material. It possesses excellent physical and chemical properties including the highest hardness and thermal conductivity, and good resistance to chemical erosion. Although CVD diamond film has potential outstanding properties, its industrial applications have been limited by the non-uniform thickness and rough surface.
In the current study, the CVD diamond film is polished by the chemical-assisted mechanical method with different slurries. These slurries contain strong chemical oxidation potential and diamond powder. During the process, the diamond film was held against the rotational ceramic plate with transverse oscillation at 90 ℃ or lower. The profilometer, atomic force microscope and scanning electron microscope were used to evaluate the surface integrity of the diamond films before and after polishing. Based on the experimental results, the slurry containing potassium persulfate (K2S2O8) produces the highest material removal rate while potassium permanganate (KMnO4) develops the best local surface roughness. The strategy of using potassium persulfate for coarse polishing followed by potassium permanganate for fine polishing yields the diamond films of the best global surface roughness. The average surface roughness of the diamond film produced by the proposed technique is below 10 nm in 5 hours of polishing.

[1] 宋健民，“鑽石合成”，全華科技圖書，2000。
[2] 宋健民，“超硬材料”，全華科技圖書，2000。
[3] P.W. May, “Diamond thin films: a 21st century material”, Philosophical Transactions of the Royal Society of London. A 358, 2000, pp. 473-495.
[4] P.K. Bachmann, W. van Enckevort, “Diamond deposition technologies”, Diamond and Related Materials 1, 1992, pp. 1021-1034.
[5] J.E. Graebner, S. Jin, G.W. Kamlott, J.A. Herb, C.F. Gradinier, “Unusually high thermal conductivity in diamond films”, Applied Physics Letters 60, 1992, pp. 1576-1578.
[6] A.P. Malshe, B.S. Park, W.D. Brown, H.A. Naseem, “A review of techniques for polishing and planarizing chemically vapor-deposited (CVD) diamond films and substrates”, Diamond and Related Materials 8, 1999, pp. 1198-1213.
[7] G.S. Raju, “Chemical assisted mechanical polishing and planarization of CVD diamond substrates for MCM application, Master’s thesis, University of Arkansas, 1994.
[8] 黃舉錐、蕭瑞聖，”精密鑽石工具”，松祿文化出版，1992。
[9] E.M. Wilks, J. Wilks, “The mechanical strength and reliability of natural diamond”, Diamond Research, 1978, pp. 2-10.
[10] E. Bruton, “Diamonds”, N.A.G. Press Ltd., London, 1970.
[11] C.D. Ollison, W.D. Brown, A.P. Malshe, H.A. Naseem, S.S. Ang, “A comparison of mechanical lapping versus chemical-assisted mechanical polishing and planarization of chemical vapor deposited (CVD) diamond”, Diamond and Related Materials 8, 1999, pp. 1083-1090.
[12] S.E. Grillo, J.E. Field, F.M. van Bouwelen, “Diamond polishing: the dependency of friction and wear on load and crystal orientation”, Journal of Physics D: Applied Physics 33, 2000, pp.985-990.
[13] H. Ohmori, K.Nishmura, W. Lin, A. Makinouchi, S. Ibuki, T. Kono　and O. Takechi, "Mirror surface finishing of CVD diamond Film by　ELID Grinding", New Diamond and Frontier Carbon Technology 10, 2000, pp. 151-160.
[14] M. Yoshikawa, F. Okuzumi, "Hot-iron-metal machine for CVD diamond films and characteristics of the polished surface", Surface and Coatings Technology 88, 1996, pp. 197-203.
[15] Q.H. Fan, J. Gracio, E. Pereira, “Residual stresses in chemical vapour deposited diamond films”, Diamond and Related Materials 9, 2000, pp. 1739-1743.
[16] C.J. Tang, A.J. Neves, A.J.S. Fernandes, J. Gracio, N. Ali, “A new elegant technique for polishing CVD diamond films”, Diamond and Related Materials 12, 2003, pp. 1411-1416.
[17] P. Grodzinski, “Diamond Technology”, N.A.G. Press Ltd., London, 1953.
[18] M. Yoshikawa, “Development and performance of a diamond-film polishing apparatus with hot metals”, Diamond Optics Ⅲ SPIE 1325, 1990, pp. 210-221.
[19] H. Tokura, C.F. Yang, M. Yoshikawa “Study on the polishing of chemically vapour deposited diamond film” Thin Solid Films 212, 1992, pp. 49-55.
[20] C.E. Johnson, “Chemical polishing of diamond”, Surface and Coatings Technology 68, 1994, pp. 374-377.
[21] A.M. Zaitsev, G. Kosaca, B. Richarz, V. Raiko, R. Job, T. Fries, W.R. Fahrner, “Thermochemical polishing of CVD diamond films”, Diamond and Related Materials 7, 1998, pp. 1108-1117.
[22] V.N. Tokarev, J.I.B. Wilson, M.G. Jubber, P. John, D.K. Milne, “Modeling of self-limiting laser ablation of rough surfaces: application to the polishing of diamond films”, Diamond and Related Materials 4, 1995, pp. 167-175.
[23] A.M. Ozkan, A.P. Malshe, W. D. Brown, “Sequential multiple-laser-assisted polishing of free-standing CVD diamond substrates”, Diamond and Related Materials 6, 1997, pp. 1789-1798.
[24] S. Gloor, S.M. Pimenov, E.D. Obraztsova, W. Luthy, H.P. Weber, “Laser ablation of diamond films in various atmospheres”, Diamond and Related Materials 7, 1998, pp. 607-611.
[25] E. Cappelli, G. Mattei, S. Orlando, F. Pinzari, P. Ascarelli, “Pulsed laser surface modifications of diamond thin films”, Diamond and Related Materials 8, 1999, pp. 257-261.
[26] A. Hirata, H. Tokura, M. Yoshikawa, “Smoothing of chemically vapour deposited diamond films by ion beam irradiation”, Thin Solid Films 212, 1992, pp. 43-48.
[27] S. Kiyohara, K. Mori, I. Miyamoto, J. Taniguchi, “Oxygen ion beam assisted etching of single crystal diamond chips using relative oxygen gas”, Journal of Materials Science: Materials in Electronics 12, 2001, pp. 477-481.
[28] N. Toyoda, N. Hagiwara, J. Matsuo, I. Yamada, “Surface treatment of diamond films with Ar and O2 cluster ion beams”, Nuclear Instruments and Methods in Physics Research B 148, 1999, pp. 639-644.
[29] G.M.R. Sirineni, H.A. Naseem, A.P. Malshe, W.D. Brown, “Reactive ion etching of diamond as a means of enhancing chemically-assisted mechanical polishing efficiency”, Diamond and Related Materials 6, 1997, pp. 952-958.
[30] H.B. Hermanns, C. Long, H. Weiss, "ECR plasma polishing of CVD diamond films", Diamond and Related Materials 5, 1996, pp. 845-849.
[31] F. Silva, R.S. Sussmann, F. Benedic, A. Gicquel, “Reactive ion etching of diamond using microwave assisted plasmas”, Diamond and Related Materials 12, 2003, pp. 369-373.
[32] D.R. Lide, “CRC handbook of chemistry and physics”, CRC Press, Cleveland, 2002.