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研究生： 林俊良
Jun-Liang Lin
論文名稱： 利用射頻磁控濺鍍法於可撓式基板鍍著具鈦介層之氮化鈦薄膜
TiN/Ti thin film on flexible PET substrate deposited by RF magnetron sputtering
指導教授： 黃嘉宏
Jia-Hong Huang
口試委員:
學位類別： 碩士
Master
系所名稱： 原子科學院 - 工程與系統科學系
Department of Engineering and System Science
論文出版年： 2008
畢業學年度： 96
語文別： 英文
論文頁數： 77
中文關鍵詞： Flexible substrate 、TiN thin films 、Gas permeability
相關次數： 點閱：2  下載：0 
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    • The objective of this study was to prepare TiN/Ti thin films on PET substrate, with excellent adhesion, high gas anti-permeability and low sheet resistance. TiN/Ti thin films have been successfully deposited on PET substrate by RF magnetron sputtering. The respective deposition durations of Ti and TiN thin films were chosen as the controlling variable in the deposition process. The gas anti-permeability, sheet resistance, surface adhesion and optical properties of TiN/Ti thin films were systematically investigated. In addition, the effects of Ti interlayer, packing factor and film thickness on these properties were also studied. The crystal structure, chemical composition and packing factor of the TiN/Ti thin films were characterized by glancing incidence X-ray diffraction (GIXRD) and Rutherford backscattering spectrometry (RBS), respectively. Water vapor transmission rates (WVTR) of the TiN/Ti thin films were measured using a MOCON instrument. The electrical resistance was determined using a four-point probe. Experimental results showed that the structure of TiN thin films deposited on both PET and Ti/PET substrates were amorphous. The film adhesion for all TiN/PET and TiN/Ti/PET samples was excellent. The Ti interlayer could effectively increase the packing factor of TiN thin films. The gas permeability of TiN/Ti thin films was related to the synthetic parameter of packing factor × total thickness of the coating. The WVTR of the specimens would level off, if the TiN/Ti thin films reached a critical thickness of about 100 nm in this study. The sheet resistance of the TiN/Ti thin films decreased with increasing film thickness. The packing factor of the TiN thin film increased with the thickness of Ti interlayer and hence decreasing the sheet resistance. The results indicated that adding a Ti interlayer could effectively improve the gas permeability and sheet resistance of the TiN/Ti thin films on PET substrate. The superior performance of the thin films nearly reached the requirements for the applications in flexible LCDs, inorganic solar cell, and thin film battery.

    謝誌 摘要 Abstract Contents List of Figures List of Tables Chapter 1 Introduction Chapter 2 Literatures Review 2.1 Characteristics of barrier thin films 2.1.1 Titanium nitride 2.1.2 Titanium oxynitride 2.2 Characteristics of polymer substrates 2.3 Deposition method 2.4 Effect of film’s thickness on the properties of thin films 2.5 Effect of interlayer on the properties of thin films 2.6 Mechanism of gas permeation Chapter 3 Experimental Details 3.1 Specimens Preparation and Deposition Process for TiN/ Ti thin films 3.2 Characterization Methods 3.2.1 Rutherford Backscattering Spectroscopy (RBS) 3.2.2 Secondary Ion Mass Spectroscopy (SIMS) 3.2.3 Glancing Incidence X-ray Diffraction (GIXRD) 3.2.4 Field-Emission Gun Scanning Electron Microscopy (FE-SEM) 3.3 Properties Measurement 3.3.1 Permeability 3.3.2 Sheet Resistance 3.3.3 Adhesion 3.3.4 Wettability 3.3.5 Roughness 3.3.6 Transmittance 3.3.7 Color (L*a*b*) and Reflectance Chapter 4 Results 4.1 Chemical Compositions 4.2 Structure 4.2.1 GIXRD 4.2.2 Packing factor 4.3 Properties 4.3.1 Gas permeability 4.3.2 Sheet resistance 4.3.3 Adhesion and wettability 4.3.4 Transmittance Chapter 5 Discussion 5.1 Properties 5.2 Packing factor 5.2.1 Variation of packing factor 5.2.2 Gas permeability 5.2.3 Sheet resistance 5.3 Effect of Ti interlayer Chapter 6 Conclusions References Appendix A Taguchi method Appendix B Raw data of contact angle Appendix C FESEM Appendix D AFM Appendix E SIMS Appendix F Color and reflectance

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