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研究生: 王帥文
論文名稱: 光罩配置對TFT Array生產系統之影響探討
The Impact of Mask Allocation on TFT Array Production System
指導教授: 林則孟
口試委員:
學位類別: 碩士
Master
系所名稱: 工學院 - 工業工程與工程管理學系
Department of Industrial Engineering and Engineering Management
論文出版年: 2007
畢業學年度: 95
語文別: 中文
論文頁數: 91
中文關鍵詞: 陣列廠回流光罩副資源配置投料派工
相關次數: 點閱:3下載:0
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  • 摘要
    TFT-LCD(thin film transistor-liquid crystal display)面板由薄膜電晶體(TFT Array)、面板組立(Cell)及模組(Module)三大製程所構成,其中以TFT Array製程為最重要。由於TFT Array製程為三段製程之首,且因製程時間最長、機台設備最為昂貴,成為TFT-LCD製程的瓶頸所在。TFT Array製程對整個生產鏈之產出有重要的影響,若未能達到生產規劃部門所制定的產出計畫,將使後續製程發生缺料的狀況。因此,如何有效控制製造現場之在製品分布狀況,便成為影響TFT-LCD生產鏈的關鍵因素。
    TFT Array製程具有許多特性與限制,使其現場控制變得相當複雜。TFT Array製/程具有受限產能迴流的特性,再加上其中的瓶頸黃光製程除機台以外需搭配光罩才可加工,每種產品的各迴流層都有其專屬的光罩,且光罩與瓶頸機台之間有一特定的搭配限制。同時,因為光罩成本昂貴,製造現場擁有之光罩數量有限,使光罩成為現場控制需要考量的限制。在迴流、光罩與機台搭配關係及光罩數量限制的特性下,造成現場之產能隨搭配方式波動,本研究提出考量黃光機台前在製品分布狀況之動態光罩重配置方法,來解決現場因光罩配置造成之產能波動問題,並透過模擬分析與傳統迴流環境中所討論之投料、派工方法進行比較,探討何者對系統績效影響較為顯著。
    藉由實驗設計與模擬分析發現,本研究所提出的光罩重配置方法,無論在何種生產條件下,皆可使現廠產能有效控制,並發現光罩配置對系統績效之影響遠大於投料與派工方法。

    關鍵字:陣列廠、迴流、光罩、投料、副資源配置。


    目錄 第1章 緒論 1 1.1 研究背景與動機 1 1.2 研究目的 2 1.3 研究範圍與限制 2 1.4 研究步驟與方法 3 第2章 TFT Array生產系統分析與問題定義 5 2.1 Array 廠產品與製程簡介 5 2.2 生產系統特性說明 8 2.2.1 整體生產環境特性分析 8 2.2.2 瓶頸機台特性分析 10 2.2.3 非瓶頸機台特性分析 13 2.2.4 生產型態分析 14 2.3 TFT Array製造現場之問題分析 17 2.3.1 機台與光罩限制對現場產能之影響 17 2.3.2 迴流特性之影響 20 2.4 研究問題定義 21 2.4.1 研究問題說明與定義 21 2.4.2 假設條件 22 2.4.3 績效指標 22 第3章 文獻回顧 24 3.1 迴流環境之投料方法 24 3.2 迴流環境之派工方法 26 3.3 結合投料與派工問題 28 3.4 TFT array 相關文獻 30 第4章 研究架構與方法 33 4.1 規劃期間與光罩重新配置時間之關係 33 4.2 光罩重配置之概念說明 34 4.3 光罩重配置步驟與方法描述 38 4.3.1 記錄黃光區前在製品狀態 39 4.3.2 記算黃光區前在製品權重 40 4.3.3 計算規劃時隔內機台可用產能 42 4.3.4 修改光罩與機台搭配之限制 42 4.3.5 透過數學規劃方法重新配置光罩 43 4.3.6 依照重新配置結果控制現場 49 4.4 小結 51 第5章 光罩重配置方法模擬驗證與穩定性分析 52 5.1 模擬實驗目的 52 5.2 模擬實驗因子分析 53 5.2.1 影響因子分析 53 5.2.2 控制因子水準訂定 54 5.2.3 模擬收集之績效指標說明 56 5.3 系統描述與假設 57 5.3.1 系統描述 57 5.3.2 基本輸入資料 58 5.3.3 範圍與細緻度 62 5.4 模擬模式建構 75 5.4.1 模式建構 75 5.4.2 模式確認與驗證 77 5.4.3 模擬實驗的進行 78 5.5 模擬實驗結果分析 79 5.5.1 動態光罩配置效益分析 79 5.5.2 實驗設計分析流程與結果說明 83 5.5.3 小結 90 第6章 結論與建議 91 6.1 結論 91 6.2 建議 92

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