本研究將提供以奈米3D微影技術為一加工平台製作微光學元件，並以製作微透鏡陣列(Microlens Array, MLA) 作為本研究重點，另外製作特殊中空、階梯型微光學元件，並驗證其可行性。
隨著光學感測器的發展，微光學元件需求增大，其中又以微透鏡陣列等繞射元件之製造百家爭鳴，而現今的微透鏡製造技術較少直接製作且具有隨意非球面輪廓的光學元件陣列，因此本研究將結合奈米3D微影技術能快速製作複雜3D微結構的優勢，開發出一個方法製作複雜且大面積之微透鏡陣列。
本研究將利用奈米級3D 微影技術(Nano 3D Lithography, N3L)，此技術結合雙光子吸收(Two Photon Absorption, TPA)與光致聚合技術(Photon Polymerization)與雷射直寫技術(laser-direct writing)概念，其加工精度可至次微米等級，並且可加工任意形狀的3D 微結構。利用此技術製作的結構解析度非常高，表面粗糙度佳等特性，隨機任意的非球面係數曲面的微光學元件更能表現此製程的優越性。
本研究將針對微光學陣列進行製作，透過數值運算之路徑規劃，進行製作凸型(Convex)、凹型(Concave)非球面微透鏡陣列，同時也針對中空、階梯型、有銳角等複雜的微光學元件結構進行製程開發，並加入自動化拼接與雷射加工功率自動化回授修正模組以利製作大面積陣列，以利後續應用或是翻模製作成模具量產之可行性。

In this study, we will take Nano 3D Lithography system (N3L) as the working platform for fabricating micro optical elements and the research focus is microlens array (MLA). Furthermore, the free form hollow structure and grating structure will be manufactured to verify theirs feasibility.
Focus on microlens array. There were few technologies, which can directly produce aspheric lens micro optical array. Therefore, this study will develop large-area micro-optical components with a complex profile through the N3L. The Nano 3D Lithography (N3L) combines two-photon absorption, photon polymerization and laser-direct writing conceptions, so it can fabricate arbitrarily 3D microstructure with submicron resolution. By manufacturing arbitrarily curved surface, the superiority of this process (truly 3D, high precision and good roughness) can been demonstrated.
In this study, we focus on fabricating MLA. Through the numerical processing path planning, it can make the Convex and Concave two types of MLA by N3L. In addition, we also develop the process for producing complex micro-optical components such as hollow and grating structure. We have added automated splicing and auto-correction module for laser processing power to fabricate large-area micro-optical components for application or making molds for mass production.

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