此實驗主要探討鋰摻雜氧化鋅奈米柱(Li doped ZnO nanorods)在不同退火溫度、退火氣氛以及不同摻雜濃度下所呈現在電性、表面形貌、晶格常數以及光譜分析下的差異，藉此瞭解鋰離子在氧化鋅晶格所扮演的角色以及此摻雜形成p-type ZnO的可能性。
實驗方法主要利用磁控濺鍍(Megnetron sputtering)在矽基板、玻璃基板鍍上一層約100奈米的鎵摻雜氧化鋅種子層(GZO)，接著利用水熱溶液法(hydrothermal process)成長垂直性良好的鋰摻雜氧化鋅奈米柱，最後將試片置入爐管退火，在不同溫度及不同氣氛下退火。
檢測方法包含利用FE-SEM觀察奈米柱表面形貌、XRD探討(0002)
面的強度和偏移趨勢、UV-visible 吸收光譜得出透光率和能隙(band gap)、PL(Photoluminescence)檢測各缺陷能階、柱體表面元素成分分析(XPS)、Raman spectra檢測鍵結種類、AFM量單根奈米柱電性、TEM顯示微結構以及晶格常數。 其結果顯示鋰的摻雜會使得柱體均勻成長且XRD和TEM顯示鋰摻雜氧化鋅奈米柱其結晶方向具有優選性以及有良好的單晶wurtzite結構；UV吸收光譜顯示隨著鋰摻雜濃度上升或是退火溫度上升都會造成氧化鋅能隙變小；低溫 PL顯示在鋰離子的摻雜下，其柱體結晶性會變差；此外PL可得知缺陷的相關資訊，其顯示在不同的氧化鋅生長條件這些缺陷會有不一樣的強度；拉曼光譜分析則推測鋰的摻雜在氧化鋅內形成良好的incorporation，尤其指的是鋰填在鋅的位置上。另外在單根奈米柱電性的I-V量測上， 0.03M鋰摻雜氧化鋅奈米柱(氧氣氛下退火攝氏500度)可能顯現出p-type 性質。

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