近年來台灣光學產業快速發展，精密光學元件檢測技術隨而漸顯其重要性，而光學元件之檢測必須仰賴高解析與非接觸特性，且精度多以檢測波長之數分之一標準，故精密光學元件檢測實為光學產業發展之重要關鍵技術；有鑑於習知光學干涉儀多以標準參考鏡片為量測基準，本論文嘗試以剪切干涉儀進行鏡片之光學檢測，藉剪切干涉儀無需使用高價格之參考鏡片之特徵，佐以以共光路架構剪切干涉原理減低環境震動之影響，再經澤爾尼克多項式(Zernike Polynomial)進行波前擬和，取得三階像差和方均根誤差(Root-mean-square Error)進行剪切干涉儀準確度評鑑數據，後經商用光學模擬軟體來分析非球面透鏡之檢測技術，確認非球面透鏡之干涉量測難度及變因，並判別殘留應力所致雙折射之影響，期望針對射出成形光學塑膠鏡片製程中產品缺陷對於光學品質進行因子探討，建立未來應用塑膠光學鏡片所需光學檢測之基本量測技術之基礎。

Due to the rapid growth of optics industry in Taiwan recently, the precision inspection technology for optical elements has gradually shown its importance as well. Because the technology must rely on high resolution and non-contact features embedded in fractions of inspection wave length, the inspection has become one of the important key technologies today. Based upon the fact that most traditional interferometers depends on reference lenses for measurement basis, lateral-shear interferometer has been adopted for lens measurement in this thesis because of the characteristic in non-reference lens measurement. With the aid of low environmental effects due to co-optical path based upon interferometry, Zernike polynomials have been employed for fitting of the third order coefficients in aberration; and, RMS errors have been shown as the assessment of accuracy in measurement. Finally, simulations on inspection of aspheric lenses have been conducted for evaluating influential factors and difficulties in the interferometer as well as the effects due to residual birefringence. The basic causal factors in optical qualities have also been investigated for plastic lenses fabricated with product imperfection. The objective is to establish the fundamentals in basic inspection technology for optics industry.

1. E. Hecht (2002), Optics , Forth Edition ,Addison Wesley, New York, New York.
2. D. Malacara (1992),Optical Shop Testing , Wiley, New York, New York, 2nd Edition
3. P. Hariharan (1975)”Simple Laser Interferometer with Variable Shear and Tilt,” Appl. Opt,vol 14,pp.1056.
4. M. Philbert and M. Garyson (1961),”R□alisation et Control par strioscopie interf□rentielle de Miroirs plans,Sph□riques et parabiliques,”in Optical Instruments and Techniques,K. J. Habell,Ed.”.,Champman and Hall Inc,,London,p.352
5. M. Fran□on and M. Jordery(1953),”Application des interferences par Double R□fraction a l’Etude des Aberrations,” Rev. Opt.,32,601
6. 劉耿豪(2002),”Savart's剪切干涉儀在雷射光波前量測上之應用,”台北科技大學光電技術研究所碩士論文
7. H.H. Lee, J.H. You, and S.H. Park(2003)” Phase-shifting Lateral Shearing Interferometer with Two Pairs of Wedge Plates,”Optics Lett,vol 28,2243
8. J. B. Song, Y. W. Lee, I.W. Lee, and Y.H. Lee(2004)” Simple Phase-shifting Method in a Wedge-Plate Lateral-Shearing Interferometer,”Appl. Opt.,Vol. 43,3989
9. 馮斯瑋(2003),” 間隙剪影板光波前干涉儀之設計與實驗,” 國立臺灣大學應用力學研究所碩士論文
10. J. K. Erwin(2005),”Small-Beam Lateral-Shear Interferometer,” US PATENT 6,937,347 B2
11. J. C. Wyant (1992),”Basic Wavefront Aberration Theory for Optical Metrology,”Applied Optics and Optical Engineering,Vol XI
12. M.P. Rimmer and J.C. Wyant(1975),”Evaluation of large Aberration Using a Lateral-Shear Interferometer Having Variable Shear,”Appl. Opt.,14,142
13. F. Zernike(1934),Phsica ,pp.1,689
14. M. Born and E. Wolf(1964),”Principles of Optics.”Pergamon Press, New York,New York.
15. H. Sumita(1969),”Orthonormal Expansion of the Aberration difference Function and its Application to Image Evaluation,” Jap.J.Appl.Phys.,vol 8,pp. 1027
16. 田春林(1999),”光學薄膜應力與熱膨脹係數量測之研究,” 國立中央大學光電科學研究所博士論文
17. M.P.Rimmer(1974),”Method for Evaluating Lateral Shearing Interferograms,”Appl. Opt. ,Vol. 13,623
18. M.V.R.K. Murty(1964),”The Use of a Single Plane Parallel Plate as a Lateral Shearing Interferometer with a Visble Gas Laser Source,”Appl. Opt. ,Vol.3, 531
19. D.W. Robinson and G. T. Reid(1993),Interferogram Analysis: Digital Fringe Pattern Measurement Technique, Institute of Physics,New York, New York.
20. 徐德衍(1999), ” 剪切干涉儀概論,” 科儀新知二十一卷第二期
21. D. Malacara(1998),Interferogram Analysis For Optical Testing, MARCEL DEKKER,INC, New York, New York
22. 張智惠,黃俊杰(1993),”非球面光學之量測,” 光學工程,第四十四期