研究生: |
邱思齊 |
---|---|
論文名稱: |
CVD鑽石膜表面拋光技術之研究—熱化學拋光及化學輔助機械拋光 A Study of Polishing Technique for CVD DiamondThin Films—Thermo chemical Polishing andChemical-Assisted Mechanical Polishing andPlanarization |
指導教授: | 左培倫 |
口試委員: | |
學位類別: |
碩士 Master |
系所名稱: |
工學院 - 動力機械工程學系 Department of Power Mechanical Engineering |
論文出版年: | 2004 |
畢業學年度: | 92 |
語文別: | 中文 |
論文頁數: | 78 |
中文關鍵詞: | 化學氣相沉積鑽石膜 、熱化學拋光 、化學輔助機械拋光 |
相關次數: | 點閱:3 下載:0 |
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利用化學氣相沉積法所製造的鑽石膜是一種廣泛被應用的鑽石鍍膜技術。由於其多晶鑽石結構的特性,造成必須在後段製程中加入拋光的步驟,將表面平坦化,以增加其應用之範圍。
在各種鑽石的拋光法中,熱化學拋光以及化學輔助機械拋光均具有可達成大面積拋光、奈米等級拋光表面以及製程設備成本低等特性,故本文針對此兩種製程做研究與分析。
為了了解熱化學拋光以及化學輔助機械拋光的各項參數影響趨勢以及達成大面積拋光之目標,分別對各項參數做趨勢分析,探討表面粗度值與材料移除率的變化,建立製程參數之資料庫,已達成最適化製程參數的設計。同時藉由理論模型之建構,將理論值與實際值比較,探討熱化學拋光以及化學輔助機械拋光之拋光機制。
關鍵字:化學氣相沉積鑽石薄膜、熱化學拋光、化學輔助機械拋光、碳原子擴散
Chemical vapor deposited diamond thin firm technique is generally applied in the years. Because of the characteristic of polycrystalline diamond, it must be polished in final processes to improve the quality of surface for widely application. In many polishing technologies, thermo chemical polishing and chemical assisted mechanical polishing and planarization (CAMPP) both have the advantages: large area polishing, fine polished surface and low equipment cost.
In this article they will be experimented and analyzed. To realize the effect of the parameters in thermo chemical polishing and chemical assisted mechanical polishing and planarization, and to achieve large area polishing, they are analyzed for the variation of surface roughness, material removal rate…etc.
And a theory model is set to compare the ideal value and true value, to know the polishing process in thermo chemical polishing and chemical assisted mechanical polishing and planarization.
Keywords: Chemical vapor deposited diamond thin firm (CVDD), thermo chemical polishing, chemical assisted mechanical polishing and planarization (CAMPP)
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