研究生: |
柯智凱 Ko, Chihkai |
---|---|
論文名稱: |
塗佈、顯影機台反應室配置之優化 Optimization of chamber location for TRACK Machines |
指導教授: |
許棟樑
Sheu, D. Daniel |
口試委員: | |
學位類別: |
碩士 Master |
系所名稱: |
工學院 - 工業工程與工程管理學系 Department of Industrial Engineering and Engineering Management |
論文出版年: | 2009 |
畢業學年度: | 97 |
語文別: | 中文 |
論文頁數: | 75 |
中文關鍵詞: | 塗佈 、顯影 、微影 、反應室 、基因演算法 |
外文關鍵詞: | Coater, Developer, photo, Chamber, GA |
相關次數: | 點閱:2 下載:0 |
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摘要
本研究提出一種優化TRACK內部反應室佈置的方法,首先計算製程配方需求數量後,利用基因演算法概念設計較佳的製程配方位置,以降低總搬運距離/時間為目標。此外,本研究建立一個以VBA為基礎的軟體,可自動計算與優化的動態佈置規劃程式。
利用實際晶圓廠的生產資料去比較原佈置、SLP佈置、隨機佈置與本研究所提出佈置的績效,並考慮先進先出法(FIFO)與關鍵比率法(CR)兩種派工法則情況下。使用總完工時間(Makespan)與平均週期時間(Average cycle time)兩項指標作為績效衡量,研究結果顯示本研究所提出的佈置規劃顯著優於原佈置、SLP佈置與隨機佈置。
Abstract
This research proposed a quantitative method to optimize the internal chamber layout of a TRACK machine. It starts with calculating the required chambers for each recipe and then assigns their locations using Genetic Algorithm. The objective is to minimize the transport time. The research also developed a VBA-based software to automatic calculate the optimal layout planning, enabling dynamic layout planning.
Real data from a semiconductor Fab were used to compare the performance among the fab original layout, layout by Systematic layout planning (SLP), a random layout and the layout proposed by this research. First In First Out (FIFO) and Critical Ratio (CR) were used for test dispatching rules. Using makespan and average cycle time as performance measures, the layout resulted from this research is performs significantly better than the layout from SLP, original layout, and random layout.
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