本實驗以反應性濺鍍的方式來鍍製銀氧化物薄膜，探討製程參數包括鍍膜功率、氧氣分壓比例、直流濺鍍製程與射頻濺鍍製程等，對薄膜組成、微結構、光學性質與熱性質的影響。發現提高鍍膜功率與降低氧氣分壓比例，較容易獲得熱穩定度高的銀氧化物；在直流濺鍍製程中，提高鍍膜功率與降低氧氣分壓比例，也可以提高薄膜中總體金屬銀的比例與結晶銀的比例；但是在射頻濺鍍製程中，氧氣分壓比例超過一特定值時，薄膜中銀的百分比不會隨鍍膜功率提高而增加。並透過TGA實驗，嘗試找出各種銀氧化物的熱分解溫度，並與其他文獻報導的結果相比較。
最後嘗試以單層膜結構製作DVD-R的碟片，透過動態測試與AFM量測結果，多項記錄特性已經達到規格，證明此材料確實具備光記錄應用的優越特性，極具發展潛力。

This research is to investigate the relationships between process parameters such as DC power, RF power, and oxygen partial pressure, and silver oxide thin films properties, such as composition, microstructures, optical and thermal properties. It is shown that silver oxides with higher thermal stability are easily obtained at higher deposition power and lower oxygen partial pressure. In DC sputtering processes, higher deposition power and lower oxygen partial pressure can increase the percentage of total metallic silver and crystallized silver in thin films. In RF sputtering processes, it was observed that total metallic silver percentage in thin films was independent of RF power when oxygen partial pressure exceeded some specific value. The thermal decomposition temperatures of silver oxides were obtained from TGA results and compared with the reported results.
Finally, DVD-R with single-layer structure was made applying silver oxide film. Both the dynamic testings and AFM results of the DVD-R showed that lots of specifications were met. It demonstrated that silver oxides were potential candidates for optical recording.

1. L. A. A. Pettersson, P. G. Snyder: Thin Solid Films, 270 (1995) 69
2. A. A. Schmidt, J. Offermann, R. Anton: Thin Solid Films, 281 (1996) 105
3. J. A. Allen: Aust. J. Chem., 14 (1961) 20
4. S. Dallek, W. A. West, and B. F. Larrick: J. Electrochem. Soc., 133 (1986) 2451
5. R. Dallenbach, J. Painot and P. Tissot: Polyhedron, 1 (1982) 183
6. A. N. Mansour, S. Dallek, and C. R. Anderson: Physics B, 158 (1989) 519
7. W. A. Parkhurst, S. Dallek, and B. F. Larrick: J. Electrochem. Soc., 131 (1984) 1739
8. A. N. Mansour, and S. Dallek: J. Electrochem. Soc., 137 (1990) 1467
9. S. Dallek, W. A. Parkhurst, and B. F. Larrick: Thermochemical Acta, 78 (1984) 333
10. A. J. Varkey, and A. F. Fort: Sol. Energy Mater. and Sol. Cells, 29 (1993) 253
11. B. E. Breyfogle, C. -J. Hung, M. G. Shumsky, and J. A. Switser: J. Electrochem. Soc., 143 (1996) 2741
12. N. D. Bhola, and J. A. Woollam: J. Appl. Phys., 66 (1989) 5602
13. J. Tominaga, S.Haratani, K.Uchiyama, and S. Takayama: Jpn. J. Appl. Phys., 31 (1992) 2757
14. J. A. McMillan: J. Inorg. Nucl. Chem., 13 (1960) 28
15. V. Scatturin, P. L. Bellon, and A. J. Salkind: J. Electrochem. Soc., 108 (1961) 819
16. J. A. Allen: Aust. Chem., 14 (1960) 20
17. E. F. Gross and F. I. Kreingold: Optics and Spectroscopy, 10 (1961) 211
18. G. D. Nany, J. B. Vergette, and J. P. Connolly: Can. J. Chem., 49 (1971) 3986
19. D. R. Lide: CRC Handbook of Chemistry and Physics, 77th ed., p. 4-84
20. D. R. Lide: CRC Handbook of Chemistry and Physics, 77th ed., p. 5-5
21. B. Standke and M. Jansen: Angewandte Chemie-International edition in English, 24 (1985) 118
22. C. R. Anderson, S. Dallek, W. A. Parkhurst, B. F. Larrick: The Electrochemical Society Meeting (Washington, D. C., 1983) p. 9-14
23. S. Haratani, J. Tomonaga, H. Dohi, and S. Takayama: J. Appl. Phys., 76-2 (1994) 1297
24. X. G. Haung, D. F. Shen: Journal of Inorganic Materials, 13-3 (1998) 440
25. 許柏源：清華大學碩士論文,新竹,2000
26. J. Tominaga, H. Fuji, A. Sato, T. Nakano, N. Atoda: Jpn. J. Appl. Phys., 39 (2000) 957
27. H. Fuji, J. Tominaga, L. Men, T. Nakano, H. Katayama and N. Atoda: Jpn. J. Appl. Phys., l39 (2000) 980
28. W. -C. Liu, C. -Y. Wen and K. -H. Chen, W. C. Lin and D. P. Tsai: Appl. Phys. Lett., 78 (2001) 685
29. J. H. Kim, D. Buechel, T. Nakano, J. Tominaga and N. Atoda: Appl. Phys. Lett., 77 (2000) 1774
30. E. D. Palik: Handbook of Optical Constants of Solids (Orlando, Academic Press, 1985), p. 350