本研究實驗利用微米（5 um）及次微米（0.5 um）圖形尺寸的模具對共軛高分子MEH-PPV及P3HT進行壓印，使模具上之圖形複印於共軛高分子膜面上。研究分為幾個方向，首先觀察分析壓印後高分子膜的形變情形，之後分別探討共軛高分子受到不同模具尺寸及模具形狀壓印後的形變、共軛高分子的濃度效應、原始薄膜厚度、壓印時的溫度、基材效應及壓印時間與壓印應力大小對共軛高分子光致發光(PL)的影響，最後再利用共軛高分子壓印之後應力釋放及共軛高分子結晶性來解釋壓印的結果。

The experiment of this study uses the mold with microns (5 um) and sub-micron (0.5 um) pattern-size to imprint on the conjugated polymer, MEH-PPV and P3HT, and the mold of patterns will reproduce onto the film surface of the conjugated polymer. There are several aspects in this study. First, we observe the deformation situation of the imprinted polymer film. And then, we discuss the factors that influence on Photoluminescence (PL) of conjugated polymer after imprinting which caused by the mold size and shape, concentration of the conjugated polymer, initial film thickness, temperature during imprinting, substrate effect, imprinting time and the strength of stress, respectively. Finally, we try to explain the result of the imprinting data by stress relaxation after imprinting and the crystallization of conjugated polymer.

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