本研究提出以掃描浸潤式微影技術(SIL, Scanning Immersion lithography)製作大面積之亂數佈點導光板結構。SIL技術係透過媒合液體(matching liquid)的施加以減少光阻/光罩空隙造成的繞射誤差，此外媒合液體也能作為掃描曝光時光罩和光阻之間的潤滑與緩衝，這些優點將有利於大面積的掃描曝光，並有效改善微影的解析度。實驗結果顯示，利用SIL技術可製造大面積與優異表面品質(Ra~13nm)的3D微結構。亦可藉由不同的光罩圖形，搭配多軸的掃描路徑以產生不同幾何形狀的立體微結構(ex：金字塔形、半圓形、三角形或是以上結構的組合)。本研究亦透過模擬與實驗回歸分析，建立光刻幾何結構與曝光參數（包括光罩圖形、曝光劑量與顯影時間）的關係。因此當需要光刻特定幾何微結構時，便可以透過模擬分析迅速決定光罩圖形及曝光參數，大幅縮短SIL技術的製造時間。此外，本研究並以SIL技術為基礎，搭配二次曝光(Double Pattern)的概念，成功製造亂數佈點之3D陣列微菱鏡結構，未來可應用於高輝度與高均勻度之新型導光板模組技術。

This study propose using the scanning immersion lithography (SIL) technique to fabricate the light guide plate (LGP) with random-dotting micro prism array. Via applying a matching liquid between the mask/resist, the diffraction error of the gap can be effectively reduced. In addition, the liquid also act as a lubricant and a buffer for smooth movement of the mask/substrate. These advantages will benefit the performance of scanning lithography with good resolution. The experimental results show that the large-area, 3D microstructure with excellent surface quality (Ra~13 nm) can be successively fabricated based on this method. If combining with the scanning routes along different axes, microstructure with various geometries (pyramid, half- sphere or their fusion) could be generated. Furthermore, the correlation between the microstructure geometry and the SIL parameters was simulated based on experimental results and curve fitting. That means the SIL parameters, including mask shape, exposure intensity and developing time, can be determined if a microstructure with specific geometry is required. Based on this technique, a novel LGP structure with random-dotting 3D micro prism was successively realized by coupling with a double-patterning process. After this exploration, the proposed SIL technique seems has potential to fabricate novel LGP module with high brilliance and high uniformity.

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