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研究生: 王玟翔
Wang, Wen-Hsiang
論文名稱: 以T形微帶共振腔及多層介質微帶線量測金屬薄膜在微波頻段之導電率變化
Conductivity measurements of metallic films at various microwave frequencies using T-resonator method and multilayer micro-strip line
指導教授: 呂助增
Lue, Juh-Tzeng
口試委員:
學位類別: 碩士
Master
系所名稱: 理學院 - 物理學系
Department of Physics
論文出版年: 2009
畢業學年度: 97
語文別: 中文
論文頁數: 44
中文關鍵詞: 微波微帶線多層介質共振腔
外文關鍵詞: microwave, microstrip, multilayer, resonance cavity
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  •  對一般的共振腔而言,產生能量偶和的air-gaps之輸出及輸入端在高頻的時候會產生很大的幅射損耗,而為了消除此問題,我們使用T形(沒有air-gap)微帶共振腔以及多層介質的微帶線兩種不同方式來量測出金屬薄膜的微波頻段導電率。數據是由向量網路分析儀(HP-8722D)所測得,在經過電磁理論計算後T形微帶共振腔量測法可獲得金屬薄膜在微波頻段的導電率,但多層介質線形微帶計算出的值都接近零,不合理,最後我們對這兩種量測方法之做一比較。


    第一章 微帶傳輸線 3 1.1 微帶線之結構 3 1.2 有效介電常數 4 1.3 多層介質微帶線的Single-layer reduction Process(SLR)5 1.4 Variational Method 6 1.5 微帶線的頻散效應 12 1.6 微帶線的Open-End效應 14 1.7 微帶線之損耗 15 第二章 T形共振腔 17 2.1串聯共振電路 17 2.2 T形共振腔 18 2.3薄微帶線的損耗修正 21 第三章 金屬傳導理論 25 第四章 實驗流程與設備 26  4.1 樣品製備 26 4.2 實驗儀器設備 27 4.2.1 蒸鍍機 27 4.2.2 濺鍍機 28 4.2.3 高頻量測裝置 29 4.2.4 拉塞福回向散射(RBS) 31 第五章 實驗結果與討論 33 第六章 結論 42 參考資料 43

    參考資料
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    [2]R. E.COLLINS,‘Field theory of guided waves’(McGraw-Hill, 1960)

    [3]R. Crampagne, M. Ahmadpanah and J. Guiraud,‘A simple method for detering the green's function for large class of MIC lines having multilayered dielectric structures.’IEEE Trans. Microwave Theory Tech., vol. MATT-26, pp82-87,Feb 1978.

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    [20]H. Y. Lee and T. Itoh, ’Wideband conductor loss calculations of planar quasi-TEM transmission lines with thin conductors using a phenomenological loss equivalence method’in 1989 IEEE MTT-S Int. Microwave Symp. Dig., Long Beach, CA,pp.367-370

    [21]T. Hiraoka, T. Tokumitsu, and M. Aikawa, ‘Very small wide-band MMIC magic using microstrip lines on thin dielectric film’ IEEE Trans. Microwave Theory Tech, Vol. MTT-37,pp.1569-1575

    [22]科儀新知第十七卷三期84.12吳秀錦 ‘拉塞福回向散射分析及其應用’

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