針對生產製程兼具隨機平移和線性漂移等現象，目前尚無批次控制方法在此架構下討論，不過已有不少相關文獻分別探討僅包含隨機平移或線性漂移之製程。針對有隨機平移的生產製程，Chen and Elsayed (2002) 提出一描述隨機平移現象的模型，並推導出EWMA回饋控制器之最適固定折扣因子；而針對有線性漂移的生產製程，Tseng, et al.(2007) 提出Modified VEWMA回饋控制器，以簡單的回饋控制機制來克服製程存在線性漂移現象，同時利用變動折扣因子加快製程產出的收斂速度。本論文主要探討Modified VEWMA回饋控制器在製程兼具隨機平移和線性漂移的情況下之績效表現，以及有別於Tseng, et al.(2007) 限制在指數遞減之變動折扣因子選取方式，採用解析解的方法推導出最適變動折扣因子，最後將以模擬研究比較不同變動折扣因子挑選方式之Modified VEWMA以及Chen and Elsayed (2002) 回饋控制器之績效表現。

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