在本實驗中，我們是以CF4和N2作為前驅物並利用固態石墨靶（碳元素純度高達99.999%）作為陰極材料，在過濾式陰極電弧電漿系統合成非晶質碳材薄膜。其中我們藉由改變氣體分子的流量，並利用X光光電子能譜（XPS）來觀察此非晶質碳氮氟薄膜（a-C:F:N films）的化學鍵結情形。發現隨著通入CF4氣體流量的上升，此薄膜的鍵結會有往高能遷移的特性。除此之外，我們還利用拉曼光譜來研究薄膜石墨化的程度；利用低掠角的X光繞射得到薄膜的晶體結構；利用掃描式電子顯微鏡得到膜厚和薄膜的表面形貌。觀察到在通入的四氟化碳氣體流量增加下，薄膜的表面形貌將從純粹的薄膜結構轉變成奈米團簇薄膜的形貌。並進一步地利用原子力顯微鏡來研究薄膜的表面粗糙度和更進一步的表面形貌，發現隨著通入的氣體流量上升薄膜的表面粗糙度將隨之提升。最後利用陰極發光技術和奈米檢測系統探討薄膜的發光特性和機械性質。
　　

In this study, we had deposited carbon-related films in a 90̊ -bend magnetic filtered cathodic arc plasma (FCAP) system using CF4 and N2 as gaseous precursors and a graphite cathode target (99.999% pure). X-ray photoelectron spectroscopy (XPS) was used to study the chemical bondings, and the result showed that as CF4 flux increases, all peaks shift to higher binding sides. Besides, the microstructures of the films were investigated using Raman spectroscopy and X-ray diffraction. The thickness and surface morphology of the films were measured by a field emission scanning electron microscope. It showed that the nanoclusters were clearly observed instead of monotonic film growth with the increasing of CF4 content. The surface roughness and morphology of the films were examined by an atomic force microscopy in advance. Finally, the luminescence character was performed by cathodoluminescence spectra and the mechanical properties of the films were detected by a nano-indentation system.

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