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| 研究生： |
莊啟煌 Chuang, Chi-huang |
|---|---|
| 論文名稱： |
使用Ni薄膜和奈米顆粒催化劑提高Si陽極之電解水效能 Enhanced Water Splitting Performance of Si Photoanode using Ni Thin Film and Nanoparticle Catalyst |
| 指導教授： |
吳孟奇
Wu, Meng-Chyi 程育人 Cheng, Yuh-Jen |
| 口試委員: |
陳啟文
楊智超 |
| 學位類別： |
碩士 Master |
| 系所名稱： |
電機資訊學院 - 電子工程研究所 Institute of Electronics Engineering |
| 論文出版年： | 2017 |
| 畢業學年度： | 105 |
| 語文別： | 中文 |
| 論文頁數： | 57 |
| 中文關鍵詞： | 電解水 、鎳薄膜 、快速熱退火 |
| 外文關鍵詞： | Water Splitting, Ni film, Rapid Thermal Annealing |
| 相關次數： | 點閱：2 下載：0 |
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在本論文中，我們利用快速熱退火(RTA)方法將鎳薄膜聚集成奈米小球，利用原子力顯微鏡(AFM)觀察鎳薄膜經過各種快速熱退火後的各種表面形態，並使用光電化學系統產氫，使用循環安伏法量測光電特性，以觀查各種鎳薄膜經過快速熱退火後相對於鎳薄膜之光電特性
我們得到50、70Å鎳薄膜經過500℃ RTA聚成奈米小球後，相比於50、70Å鎳薄膜、和經過其他溫度(650℃、800℃)快速熱退火後，照光電解下有更小的起始電位、更大的電流密度，效率更高的光電化學陽極。並且經過2小時照光電解下(電流密度大於15mA/cm2)再經過循環安伏法量測光電特性，發現光電流密度幾乎並未變動，代表此陽極具有良好的化學穩定性。
This thesis reports the study of using Ni nanoparticle to enhance photoelectrochemical water splitting performance. Rapid Thermal Annealing (RTA) method is used to aggregate nickel thin film into Ni nanoparticles. The effect of different RTA conditions to Ni nanoparticle formation is investigated using Atomic Force Microscopy (AFM). Cyclic voltammetry method is used to measure the photoelectric water splitting performance of various nickel nanoparticle samples and compare it to nickel thin film coated samples.
Ni nanoparticles fabricated from annealing 50 Å and 70 Å nickel film at 500 ℃,as compared to 50 Å and 70 Å nickel thin film and other annealing temperature (650 ℃,800 ℃),have smaller onset voltage, greater current density, and higher efficiency. Ni nanoparticle fabricated from 50 Å shows better performance than 70 Å sample. After 2 hours of water splitting (current density greater than 15mA/cm2) and through the cyclic voltammetry measurement, the Ni nanoparticle samples show excellent photocurrent and surface stability.
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