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研究生： 陳美芬
Ｍei-Fen Chen
論文名稱： 微波輔助轉印微影
Microwave-Assisted Imprint Lithography
指導教授： 朱鐵吉
Tieh-Chi Chu
口試委員:
學位類別： 碩士
Master
系所名稱： 原子科學院 - 生醫工程與環境科學系
Department of Biomedical Engineering and Environmental Sciences
論文出版年： 2005
畢業學年度： 93
語文別： 中文
論文頁數： 105
中文關鍵詞： 毛細力 、微波 、轉印微影
外文關鍵詞： capillary force, microwave, imprint lithography
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    • 在許多奈米製造技術中，光學微影、電子束微影和轉印微影是經常用來製造奈米元件以及奈米結構的方法。而在1995年轉印微影就被提出可以用於製造奈米元件。如今，我們提出一種嶄新的方法，利用微波輔助轉印微影；讓微波加熱光阻使其溫度超過玻璃轉移溫度(Tg點)，進而從固態變成融熔態，再利用毛細力讓光阻在模板空腔中成長出圖形。
    本論文中我們利用微波的主要原因是其具有快速以及選擇性加熱的特性。不同的物質因本身散逸係數不同，吸收微波能量的效率也跟著不同。一些散逸係數較低的物質就不容易被微波加熱，如石英、聚二甲基矽氧烷(PDMS)等。相對的，一些散逸係數較高的物質如聚合物、光阻等，其容易吸收微波能量而達到加熱的效果。所以利用微波此種特性，我們可以讓光阻加熱，卻不使PDMS模板因加熱而變形。
    本論文討論要點共分四部份，第一部分為不同光阻運用於微波輔助轉印微影之探討；第二部分為G-line光阻不同軟烤溫度的研究；第三部分探討不同的微波加熱時間與功率對實驗的影響；最後一部分將所求得的各項最佳化條件運用於微波輔助轉印微影製做出各種不同的圖形。

    The novel nanofabrication technique such as photolithography, electron beam lithography and imprint lithography was used to manufacture nanodevices and nanostructures. Imprint lithography have been introduced to nanoscale structures fabrication for many years since 1995. Now, we develop a new microwave-accelerated molding method to deform the polymer, when the temperature is increased to the Tg, the resist will start to melt and deform by the mold shape due to capillary force interaction.
    Microwave heating is a selective and rapid heating process for polar compound, and generally operates at 2.45 GHz. The absorption efficiency of microwave energy for different materials is dependent on the intrinsic dissipation factor. Lower dissipation factor, such as PDMS or quartz, are not easily heated by microwave irradiation. On the contrary, the high dissipation factor materials, such as polymer or resist can be effective heating.
    This thesis contains four parts. First, we try to study the different resists which one is suitable for microwave-accelerated imprint lithography. Second, we investigate into various soft-baking temperatures for G-line resist. Third, using various heating time and power of microwave to test and to verify the accuracy of pattern in microwave-accelerated imprint lithography. Finally, we use different molds in microwave-accelerated imprint lithography to evaluate the integrity of patterns.

    摘要……………………………………………...……………………….I 謝誌……………………………………………...……………………...Ⅲ 總目錄……………………………………………...………………… Ⅳ 表目錄……………………………………………...………………...Ⅸ 圖目錄……………………………………………...………………….Ⅹ 第一章 緒論…………………………………………...………...………1 1.1概述…………………………………………...………...1 1.2奈米轉印技術……………………………………...…………….1 1.2.1熱壓成形式奈米轉印……………………………...………..........2 1.2.2步進光感成形式奈米轉印………………………...………..........3 1.2.3可撓性奈米轉印………………………………...………..............4 1.3微波輔助轉印微影的方法與目的…………………………………5 1.4本文架構……………………………………………………………7 第二章 文獻回顧…………………………………………...………….8 2.1前言…………………………………………………………………...8 2.2 PDMS模板……………………………………………………………8 2.2.1 PDMS基本性質……………………………………...…………….8 2.2.2 PDMS模板性質探討…………………………….………………...9 2.3毛細力原理…………………………………………………………12 2.3.1表面現象…………………………….………………………......12 2.3.2表面張力與接觸角………………….………………………......14 2.3.3毛細現象………………….………………………........……......17 2.4 微波…………………………………………………………………21 2.4.1微波特性………………….………………………........……......21 2.4.2微波加熱原理………………….………………………..............24 2.4.2.1偶極矩轉動……………….……………………….............24 2.4.2.2離子遷移……………….……………………….................25 2.5利用螢光染劑量測溫度…………………………………………….26 2.5.1螢光……...………….………………………........……...............26 2.5.2若丹明……………………........……...........................................27 2.5.2.1溶劑對若丹明發光機制之影響……………….….............27 2.5.2.2溫度對若丹明發光機制之影響……………….….............29 2.5.2.3酸鹼度對若丹明發光機制的影響…………….….............29 第三章 實驗設備與方法……………………………………………...32 3.1 實驗藥品……………………………………………….............32 3.2 實驗設備…………………………………………………………...33 3.3實驗步驟………………………………………………………….34 3.3.1實驗前段處理..……….………………………........…….........34 3.3.1.1母模製作……….…..............................................................34 3.3.1.2母膜表面自組裝脫膜劑.......................................................34 3.3.1.3 PDMS模板製作......................................................................35 3.3.1.4微波輔助轉印微影...............................................................35 3.3.2不同光阻運用於微波輔助轉印微影之探討….......……...........36 3.3.2.1探討不同光阻之Tg點..........................................................36 3.3.2.2毛細力公式之參數研究.......................................................36 3.3.3 G-line光阻不同軟烤溫度的研究.....…….................................36 3.3.3.1不同軟烤溫度與溶劑揮發量之關係...................................36 3.3.3.2不同軟烤溫度和圖形的關係...............................................36 3.3.4不同微波加熱時間與功率的研究.....……..................................37 3.3.4.1若丹明與加熱溫度之關係...................................................37 3.3.4.2不同微波加熱時間對圖形的影響.......................................37 3.3.4.3利用若丹明探討不同微波加熱時間對光阻造成的溫度...37 3.3.4.4不同微波加熱功率對圖形的影響.........................................38 3.3.4.5利用若丹明探討不同微波加熱功率對光阻造成的溫度.....38 3.3.5微波輔助轉印微影應用於各種圖形的製作.....…......................38 第四章 結果與討論…………………………………….…….………..40 4.1實驗前段處理..……….………………………........…….........40 4.1.1母模製作……….…......................................................................40 4.1.2 PDMS模板製作..............................................................................41 4.2不同光阻運用於微波輔助轉印微影之探討….......……..................42 4.2.1探討不同光阻之Tg點..................................................................42 4.2.2毛細力公式之參數研究...............................................................45 4.3 G-line光阻不同軟烤溫度的研究.....…….......................................50 4.3.1不同軟烤溫度與溶劑揮發量之關係...........................................50 4.3.2不同軟烤溫度和圖形的關係.......................................................52 4.4不同微波加熱時間與功率的研究.....……........................................63 4.4.1若丹明與加熱溫度之關係...........................................................63 4.4.2不同微波加熱時間對圖形的影響...............................................67 4.4.3利用若丹明探討不同微波加熱時間對光阻造成的溫度...........79 4.4.4不同微波加熱功率對圖形的影響...............................................83 4.4.5利用若丹明探討不同微波加熱功率對光阻造成的溫度...........89 4.5微波輔助轉印微影應用於各種圖形的製作.....….........................91 第五章 結論………………………………………………..………100 5.1不同光阻運用於微波輔助轉印微影之探討….......……................100 5.2 G-line光阻不同軟烤溫度的研究.....…….....................................100 5.3不同微波加熱時間與功率的研究.....……......................................100 5.4微波輔助轉印微影應用於各種圖形的製作.....…..........................101 5.5未來工作與建議.....…......................................................................101 參考文獻..……………………………………….…………………….102

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