本篇論文主要討論二維光子晶體的製程與膜厚控制，利用離子束濺鍍系統(Ion Beam Sputter，IBS)作為鍍膜機台，在基板上外加射頻(Radio frequency，RF)偏壓作為蝕刻源，同時使用石英監控 (Quartz monitor)與時間監控 (Time monitor)的方式來控制鍍膜厚度，經由實驗得到不同材料的鍍膜速率和Tooling Factor的關係來修正鍍膜的參數，最後以二維自我複製式光子晶體 (2D Auto-cloning Photonic Crystal)的結構製作偏極分光鏡 (Polarization Beam Splitter，PBS)元件，期望達到光學上偏極分光的特性。
實驗的流程主要分為三個階段，第一個階段為單層膜的特性研究，使用離子束濺鍍法沉積五氧化二鉭與二氧化矽金屬氧化薄膜，加上射頻偏壓作為蝕刻源，實驗中改變射頻偏壓的大小與通入氧氣的流量，討論在不同偏壓、氧氣流量下薄膜沉積的特性，利用橢圓儀和光譜儀來測量厚度、折射率、消光係數以及修正石英監控下所需輸入的Tooling Factor，第二個階段為多層膜的特性研究，在一維週期性結構的基板上成長二維自我複製式光子晶體，調整不同的射頻偏壓以修整鋸齒狀結構外形，同時輔以掃描式電子顯微鏡觀察其剖面圖，分析鋸齒狀結構自我複製的維持特性，同時經由統計得到鋸齒狀厚度與平面厚度間的關係，第三個階段使用適當的參數利用兩種厚度監控方式製作偏極分光鏡，同時以光譜儀分析比較其光學特性。

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