化學機械拋光，是目前半導體製程中達全域平坦化最有效的方式，同時也是許多製程中不可缺少的步驟。而拋光墊為化學機械拋光中一項主要耗材，如能延長拋光墊的壽命，將可降低成本，提高製程穩定性。
又使用固定磨粒為近年拋光墊的趨勢，故本論文主要目的即在研究固定磨粒拋光墊修整之可行性，藉以延長其壽命。使用鍍上0.3μm厚的奈米鑽石圓形試片作為修整器，對固定磨粒拋光墊進行修整。發現利用奈米鑽石修整器可對固定磨粒拋光墊進行修整。

Chemical mechanical polishing (CMP) is the most effective method to achieve global planarization in semiconductor industry. The polishing pad is one of the primary consumables in CMP. Extending the life of polishing pad can reduce cost of consumables and improve process stability.
The purpose of this thesis is to study the method of dressing a fixed abrasive pad to prolong its lif e and proving the method workable. The fixed abrasive pad is dressed by a round slice that is coated diamond-like carbon about 0.3µm. We have found that using the nano-diamond dresser can dress the fixed abrasive pad. After conditioning the roughness of abrasive layer in the fixed abrasives pad resume.

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