研究生: |
葉以凝 Yeh, I-Ning |
---|---|
論文名稱: |
微波氫氣電漿之流體模型數值模擬研究 Fluid Model Numerical Simulation Study on Microwave Hydrogen Plasma Discharges |
指導教授: |
柳克強
Leou, Keh-Chyang |
口試委員: |
陳金順
Chen, Gen-Shun 張家豪 Chang, Chia-Hao |
學位類別: |
碩士 Master |
系所名稱: |
原子科學院 - 工程與系統科學系 Department of Engineering and System Science |
論文出版年: | 2018 |
畢業學年度: | 107 |
語文別: | 中文 |
論文頁數: | 93 |
中文關鍵詞: | 電漿 、微波電漿 、微波 、氫氣電漿 |
外文關鍵詞: | Plasma, Microwaveplasma, Microwave, Hydrogenplasma |
相關次數: | 點閱:1 下載:0 |
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鑽石薄膜的合成與應用是目前許多學界及業界所研究的領域,其中目前最主要的合成方式即為微波電漿輔助化學氣相沉積(Microwave plasma-assisted CVD, MPACVD)。本研究旨為探討微波電漿的建模與電漿隨參數之變化,希望掌握在對於沉積速率之重要參數隨不同操作條件下的影響與趨勢變化,藉由二維軸對稱流體模型結合電磁波、流體熱傳理論來進行模擬計算,選用鑽石薄膜沉積中最主要的氣體氫氣,包含8種粒子與34條反應式,並使用頻率在2.45 GHz之微波源來產生微波電漿。透過模擬計算之結果分析比較電漿特性與操作參數之關聯性。
模擬結果顯示,微波進入腔體後激發預期之共振模態,在基板沉積平面上方成功點起直徑約40 mm之電漿球體。在氣壓提升的同時,電漿球體逐漸縮減且電子密度也下降,但發現氫原子密度有往基板沉積平面集中的趨勢,分布變小而中心密度卻上升的現象。改變微波功率的情況下,整體的電漿範圍有明顯的擴大,在功率提升的同時,電漿內部特性也有明顯的變化,結果也顯示對電漿的特性改變而言,微波功率之改變對電漿特性的影響比氣壓還要顯著,氣體溫度與氫原子密度也隨著功率增加而提高了不少。
Synthesis of diamond film has been widely studied by many researcher and industrial. The mainly method for synthesize diamond film is microwave plasma- assisted chemical vapor deposition (MPACVD). The purpose of this study is to investigate modelling of microwave plasma and the effect of operated parameters on the plasma properties. In different operated conditions, expect to control the trend of the major factor that affect growth rate. A fluid model combine electromagnetic wave theory and heat transfer theory based numerical simulation analysis is employed. The simulation model using hydrogen plasma takes into account 8 gaseous species and 34 reactions, and the discharge is generated by a 2.45 GHz microwave source. The correlation between the plasma behavior and the operating parameters is compared by analyzing the numerical simulation results.
Simulation results show that, resonant mode as expect excited when microwave enter the cavity. Formed a diameter almost 40 mm plasma just above the substrate successfully. When the pressure promoted, plasma bulk get narrowed gradually and electron also reduced. However, hydrogen atom density getting concentrated to the substrate as the pressure increase. The tendency that distribution region decreasing but the number density in the bulk become more. For different power case, plasma get extended obviously. As the power increase, plasma properties also changed obviously. For plasma properties, simulation results reflect that the effect of power is much clear than effect of pressure. Gas temperature and hydrogen atom density also go up as power increase.
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