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研究生: 楊修維
論文名稱: 利用磁光柯爾效應對微型超薄鎳鐵合金圓盤進行研究
The Studies of Ultra-thin Micro Size Permalloy Disks by Means of Magneto-optic Kerr Effect
指導教授: 盧志權
洪在明
口試委員: 姚永德
學位類別: 碩士
Master
系所名稱: 理學院 - 物理學系
Department of Physics
論文出版年: 2012
畢業學年度: 100
語文別: 中文
論文頁數: 52
中文關鍵詞: 磁光柯爾效應
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  • 利用磁光柯爾效應(Magneto-optical Kerr Effect, MOKE),對生長在二氧化矽基板上,厚度50奈米的 圓盤進行研究。圓盤的直徑範圍約略從100到650微米。超薄圓盤是利用電子束微影製程和濺鍍鍍膜方式所製作出來。實驗結果發現圓盤磁化向量方向變化與外加磁場的關係符合之前文獻的結果:沒有垂直外加磁場的分量,有漩渦態的特性。矯頑場並沒有隨著圓盤大小而有明顯的變化,大約落在15~40 Oe之間。此外,我們的磁光柯爾量測儀量測出來磁滯曲線的訊號大小與圓盤面積大小成線性關係。


    This work takes advantage of Magneto-optical Kerr Effect (MOKE) to study the magnetic properties of 50-nm-thick disks grown on the /Si (100) wafer. The diameters of disks were roughly from 100 m to 650 m, which were fabricated by means of e-beam lithography, sputtering deposition and lift-off process. Our results show that the changes of magnetization direction on disks during sweep of magnetic field conform to the previous results of researches that the magnetization component perpendicular to outer magnetic field does not exist and our disks have the characteristic of vortex state, but coercivity seems to have no direct relationship with size of disks. They are all between about 15 Oe and 40 Oe. In addition, signals of hysteresis loops from our MOKE system change linearly with the area of disks.

    摘要............................................I Abstract........................................II 目錄............................................III 第一章 緒論............................................1 第二章 原理............................................2 2.1 磁光柯爾效應.............................2  2.1.1 簡介................................2 2.1.2 單層磁性薄膜的磁光柯爾效應..........4 2.1.3 多層磁性薄膜的磁光柯爾效應..........8 2.2 磁翻轉.................................. 12 2.2.1 磁滯曲線...........................12  2.2.2  微磁性結構系統.....................13 2.2.3  磁區運動...........................15 2.2.4  Stoner-Wohlfarth 模型..............17 2.3 文獻回顧:磁光柯爾量測儀之發展...........19 第三章 奈米圓盤製程與實驗裝置.........................21 3.1 奈米圓盤製備.............................21 3.2 濺鍍系統.................................22 3.3 磁光柯爾量測系統.........................24 3.4 磁光柯爾量測儀之實驗方式.................26 3.5 MOKE磁化向量之量測方式...................28 第四章 實驗數據與分析.................................30 4.1 實驗數據.................................30 4.1.1 偵測器超薄圓盤的大小...............30 4.1.2 磁滯曲線...........................33 4.2 數據分析與討論...........................40 4.2.1 面積7 mm × 7 mm 薄膜之探討........40 4.2.2 超薄圓盤之探討.....................43 4.2.3 改矯頑場與圓盤直徑之關係...........47 4.2.4 磁滯曲線訊號與圓盤之關係...........48 第五章 結 論........................................51 參考文獻.......................................52

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