本研究主要探討利用奈米壓印技術，製作高性能金屬線柵偏光片應用於液晶顯示器。為了要在可見光波段獲得最佳的偏光性能，該光學元件的製程特性須滿足非常高的加工精度及重複性，以製作極精細與低缺陷密度的金屬光柵。目前大多數的製程方案都還面臨著大量生產與低成本的加工挑戰。

因此，本研究開發了三種壓印平台，分別在玻璃與塑膠基板上進行高精度奈米壓印及相關金屬化製程，徹底瞭解製程中各種特性對於元件光學性能的影響，其中包含了批次式熱壓印及紫外線壓印技術，與連續滾壓式紫外線奈米壓印。另一方面，本研究採用可撓式塑膠及鎳合金模具，分別應用於平面及滾壓製程，來提升大面積的壓印均勻性與壓印品質。

為了強化整體製程品質、重複性、以及元件偏光性能，研究中透過精確的光學模擬分析與實驗數據驗證結構深寬比、幾何對稱性、及殘餘層厚度變化對光學特性的影響。此外並透過多層光柵結構的配置與金屬鍍膜製程最佳化，有效達成利用大週期偏光結構取代小週期結構，可在製程困難度大幅降低的情況下，進一步的獲得更好的偏光性能。

實驗結果顯示，最小線寬達9奈米、且深寬比大於18:1的光柵結構已成功透過連續滾壓製程搭配電漿修整技術實現。利用該結構製作的可撓式金屬線柵偏光片，在可見光波段平均穿透率為83%，消光比可達12000:1、並且滿足全波段穿透率變化小於3%的低色偏特性。

This thesis involves the fabrication of high-performance wire-grid polarizers (WGPs) by using nanoimprint lithography (NIL) for the application of liquid crystal displays (LCDs). To obtain the optimal level of polarization performance in the visible spectrum, the WGPs require an ultra-high-precision and reproducible manufacturing process that can fabricate extremely fine metallic gratings that possess a low density of defects. Most current manufacturers are confronted by a bottleneck, struggling to produce a large volume at a low cost.

Therefore, three nanoimprint platforms were developed using glass and plastic substrates, including batch-type thermal NIL, UVNIL, and roll-to-roll (R2R) UVNIL, and flexible working stamps composed of plastic and nickel alloys to facilitate large-area nanoimprinting that yields products of excellent quality and uniformity. These approaches allowed the optical properties and characteristics of each fabrication process to be thoroughly investigated.

To enhance the fabrication tolerance, repeatability, and optical performance of the WGPs, the grating aspect ratio, profile symmetry, and varying residual layer thicknesses (RLTs) were precisely simulated and controlled to achieve the targeted designs. Applying multilayer WGP grating configurations and optimal metal deposition processing substantially reduced manufacturing difficulties, enabling small WGP pitches to be replaced with large pitches, achieving improved optical performance.

Consequently, 9-nm-linewidth gratings with high aspect ratios larger than 18:1 were fabricated using R2R nanoimprinting and plasma trimming, achieving flexible WGPs that demonstrated high levels of optical performance (up to 12000:1 extinction ratio (ER) with an average transmittance of 83%) and a low color shift (transmittance variation less than 3%).

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