本論文以投射式步進快閃微影(Step-and-flash lithography)之架構建立一套精密曲面微影系統，可應用於製備滾壓式奈米壓印(Roller-type nanoimprint)之滾筒模具。透過三軸精密移動平台控制曝光系統的焦距(Focus)、工作距離(Working distance, WD)、步階位移，並採用單軸精密旋轉平台微調曲面基板作步進式角度運動；此外配合電容式位移計量測曲面微影系統主軸迴轉精度，評估該系統於允許的精度誤差範圍內，曲面無縫光阻結構之成形性。
本文將由機構設計與分析之觀點來了解滾筒進行旋轉運動時，如何確保系統之剛性，使其穩定地完成曲面無縫光阻結構的製程。由實驗過程中可得知各軸向自由度之步進位移需求，並藉由實驗結果驗證本系統之設計。而藉由拼接方式於基板所達到的無縫曲面光阻結構，其尺寸為線寬13 μm、週期50 μm與面積2×2 mm2之微米級光柵。根據本系統對曲面光阻定義能力與製程誤差控制，將可進一步評估其應用於無電鍍鎳(Electroless nickel plating)滾筒模具製備技術之可行性，而達到縮小曲面微影製程之關鍵尺寸(Critical dimension)與擴增曝寫面積的最終目的。

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