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研究生: 姜妍忻
Chiang, Yen Hsin
論文名稱: 以化學氣相沉積法成長硼摻雜型石墨烯和新穎氮化矽薄膜前驅物之合成
Develop Boron-doped Graphene by Chemical Vapor Deposition and Synthesis of Novel Precursors of Silicon Nitride Film
指導教授: 劉瑞雄
Liu, Rai Shung
口試委員: 邱博文
陳銘洲
學位類別: 碩士
Master
系所名稱: 理學院 - 化學系
Department of Chemistry
論文出版年: 2016
畢業學年度: 104
語文別: 中文
論文頁數: 107
中文關鍵詞: 化學氣相沉積法原子層沉積法摻雜型石墨烯氮化矽薄膜
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  • 第一章

    我們合成含硼的多芳香環碳氫化合物並藉由化學氣相沉積法進行硼摻雜型石墨烯的成長,成功製備大面積均勻的單層硼摻雜石墨烯,而後進行硼摻雜石墨烯物理性質的分析與量測。最後將轉移的硼摻雜石墨烯使用圖紋化製程製備成OLED元件的透明電極,以硼摻雜石墨烯作為陽極與綠色磷光元件匹配並且擁有良好的發光效率。

    第二章

    由於電子元件微小化的趨勢,原子層沉積法為目前薄膜製程研究的重點。我們以使用自組裝原子層沉積系統製成氮化矽薄膜為目標,改良與設計矽的前驅物。最後成功得到絕緣良好的介電薄膜。


    Chapter I

    We synthesized boron-contained polyaromatic hydrocarbon ,and it was used to grow boron-doped graphene by chemical vapor deposition, then we got large area and uniform monolayer graphene. We measured and analyzed its physical properties. Boron-doped graphene was patterned and used as anode in a green phosphorescent OLED device that showed an outstanding external quantum efficiency.

    Chapter II

    Since electronic devices were miniaturizated, atomic layer deposition (ALD) method for thin film has been focused recently. In this chapter, to produce silicon nitride thin film with using synthesis of novel silicon precursor is our main research goal, by home-made ALD system. Finally, we got the good insulating film.

    目錄 中文摘要------------------------------------------------I 英文摘要----------------------------------------------III 目錄---------------------------------------------------V 表目錄-----------------------------------------------VIII 圖目錄------------------------------------------------IX 附錄目錄----------------------------------------------XIV 英文縮寫對照表-----------------------------------------XVI 第一章 含硼多芳香環碳氫化合物利用化學氣相沉積成長硼摻雜型 石墨烯的研究與應用 第一節 緒論--------------------------------------------1 第二節 文獻回顧----------------------------------------9 2-1 石墨烯的合成方法-----------------------------9 2-2 成長摻雜型石墨烯 (doped-graphene)-----------12 第三節 結果與討論-------------------------------------17 3-1 實驗動機與構想------------------------------17 3-2 前驅物的合成與石墨烯成長製程結果--------------20 3-3 硼摻雜石墨烯之電性測量結果-------------------27 3-4 石墨烯應用於OLED結果------------------------31 第四節 結論------------------------------------------36 第五節 實驗部分--------------------------------------37 第六節 參考文獻---------------------------------------44 第二章 設計並合成新穎前驅物以原子沉積法生成氮化矽薄膜 第一節 緒論------------------------------------------47 第二節 文獻回顧--------------------------------------50 2-1 ALD成長薄膜系統----------------------------50 2-2 以ALD方式生成氮化矽薄膜---------------------52 第三節 結果與討論-------------------------------------56 3-1 實驗動機與構想------------------------------56 3-2 前驅物II-a~II-e的化學合成-------------------58 3-3 前驅物II-a~II-c化學活性測試------------------59 3-4 II-b ALD測試結果與討論----------------------62 第四節 結論-------------------------------------------69 第五節 實驗部分---------------------------------------70 第六節 參考文獻---------------------------------------76 附錄--------------------------------------------------77 第一章核磁共振光譜圖------------------------------------78 第二章核磁共振光譜圖------------------------------------85 第一章質譜圖------------------------------------------100 第二章質譜圖------------------------------------------102

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    第二章
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