微奈米結構與微系統元件是未來應用於光電、生物醫療與顯示器的關鍵模組，而傳統微元件的複製量產技術，需要製造程序複雜的剛性模具與昂貴的精密設備，以及高溫、高壓、冷卻的費時過程，且剛性模具與傳統壓印機構在表面平行度與表面粗糙度方面不易控制，脫膜時材料沾黏等問題亦難解決。因此為了提升微奈米結構元件在製造上的競爭力，本研究整合類LIGA製程與矽膠鑄造技術，開發創新的磁性軟模具與磁力輔助UV壓印設備，在低溫與低壓製程條件下，快速複製與生產微奈米結構元件。
依照不同的產品與製程的需求，本研究主題可區分成（a）軟模磁力輔助壓印法製作奈米線陣列與微透鏡陣列（b）磁性光阻輔助壓印法製作磁性奈米結構。
本研究所開發的『軟模磁力輔助壓印成型方法與裝置』，即是整合PDMS鑄造與參雜強磁性奈米鐵粉的方式，製作出雙層式的導磁性微奈米結構軟模，再配合塗有紫外光固化材料的基板，置入磁力輔助壓印機台中進行壓印與曝光固化，即可獲得微奈米結構元件。另外，可藉由添加不同鐵粉比例的磁性軟模具及其他製程參數的控制(例如磁壓力大小、壓印時間與UV固化時間)，成功製造出奈米線陣列與微透鏡陣列元件。
『磁性光阻輔助壓印成型』，則是自行調製強磁性的光固化材料(磁性光阻劑)，並於導磁性壓印基板(於背面電鍍鎳層)的正面塗佈磁性光固化材料後，置入磁力輔助壓印機台中進行壓印與曝光固化，以製造出具有磁性的奈米結構元。
本研究成功建立微機電製程、磁性軟模鑄造、磁力輔助壓印複製成型技術之整合技術平台。在製造原理上，此法兼具創新性與突破性；在製造特性方面則具有低溫、低壓、低成本與可快速量產(整個製程成型時間約10∼20秒)的優勢。此技術製程簡易、快速、成本低廉，非常適用於微系統光學與磁性元件之製造上，將有助於發展高附加價值的光電產業。

In recent years, microstructure devices and micro-systems have been widely used in various applications such as information processing, optical communication, optoelectronics, flat panel display and bio-technology. With the paramount concern of cost in many new micro-system applications, process technology is becoming one of the most important elements for mass production. However, the traditional processes involve high temperature, high pressure and require expensive facilities. They are complicated and time-consuming batch-wise processes.
From this perspective, there are two innovative imprinting technologies for rapid fabricating micro or nano-devices and magnetic structure proposed in the current study.
One is Magnetic force-assisted imprint technique. In this study, an electromagnetic force assisted imprinting facility with UV exposure capacity has been designed, constructed and tested. In use of electromagnetic force to press the magnetic stamp written with submicron-scale features into a UV-curable resist on the substrate, the liquid photopolymer can be patterned at room temperature. Under the proper processing conditions(magnetic force, pressing duration and UV curing dose), the polymeric microlens arrays and nano-wire structures can be successfully fabricated and have smooth surface and uniform property over a large area.
The other is ferromagnetic nanopowder-assisted imprint technology for reduced and uniform pressure during magnetic force-assisted imprint. Fe-powder is blended into the resist which is attracted on the mold written with submicron-scale features by the electromagnetic force. The experimental results show the uniform and clearly transferred patterns into the resist with less electromagnetic force. This technique implies the potential for efficient fabrication of submicron-scale features at less-force and one-step direct forming magnetic on large area with high productivity at low cost.
In summary, this innovative low-cost and high-efficiency technique has many advantages over the conventional techniques. It shows the potential for fabricating micro and submicron polymer and magnetic structures at room temperature and low pressure on large substrates with high productivity at 10~20 seconds per cycle. The author believes that the novel process is expected to give an impact to the micro-system fabrication technology and to create a highly value-added technology in optoelectronics industry.

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