使用化學氣相沉積法（CVD）成長氧化鋅(ZnO)奈米柱，並且沒有使用催化劑，成功製備在普通的玻璃基板上(玻璃基板溫度高於450℃)成長 ZnO奈米柱。不使用催化劑的製程可以降低成本以及消除製備過程中的雜質。掃描電子顯微鏡（SEM）量測，在受熱條件:鋅粉為600℃，玻璃基板受熱為450℃時，奈米柱呈排列整齊的準直成長。製程條件為:氬氣500sccm、氧氣30sccm、工作壓力2000mTorr、持溫30min。成長出良好深寬比的氧化鋅奈米柱為60:1，並且沒有使用任何退火過程。X光繞射圖譜，具強烈的(002)繞射峰，即c軸取向，代表奈米柱呈現準直性的成長。光致螢光圖譜量測(PL)，得到品質良
好的的紫外光放射，綠光缺陷近趨於零。

Using a chemical vapor deposition (CVD) technique without catalyst introduction, we have successfully prepared ZnO nanorods on an ordinary glass substrate at substrate temperatures higher than 450oC. The catalyst-free fabrication procedure can significantly avoid the formation of impurities. Based on the observation of scanning electron microscope (SEM) images, the well-aligned ZnO nanorods were grown on ordinary glass substrate when source of Zn metal powder was heated up to 600oC. The fabrication was on progress under the mixed flow of oxygen and argon gases with the rates of 30 and 500 sccm, respectively. Our as-deposition nanorods exhibit an average aspect-ratio of 60 which is pretty high for those samples without any further annealed process. The X-ray diffraction (XRD) patterns showed only a diffraction peak of (002). As a result is that our ZnO nanorods exhibit good crystal quality as well as highly c-axis preferred orientation. The photoluminescence (PL) UV emission intensity of these nanorods increases with increasing crystalline quality.

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